论文信息 - The Effects of Processing Parameters in the Low‐Temperature Chemical Vapor Deposition of Titanium Nitride from Tetraiodotitanium - 字舞流文

The Effects of Processing Parameters in the Low‐Temperature Chemical Vapor Deposition of Titanium Nitride from Tetraiodotitanium

A. Kaloyeros | A. Knorr | G. Peterson | Barry Arkles | C. Goldberg | Cheryl G. Faltermeier | Michael Jones | A. Ivanova | A. Upham