论文信息 - Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography. - 字舞流文

Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography.

D. E. Pariev | S. A. Gusev | F. Schäfers | N. Salashchenko | N. Chkhalo | A. Sokolov | M. Sertsu | A. Pestov | A. N. Nechay | V. Polkovnikov | M. Svechnikov | Y. Vainer | M. Zorina | D. Tatarskiy