MoS2 films (300 to 400 A) were radio-frequency sputtered on aluminum and nickel surfaces at elevated, ambient, cold water, and liquid nitrogen temperatures. Electron transmission micrographs and electron diffraction patterns were taken to determine the structural growth. These transmission micrographs revealed that sputtered MoS2 films at ambient and elevated temperatures (320 and 150 C) formed an irregular network of ridges. The electron diffraction patterns of these films showed relatively sharp diffraction rings, indicating crystallinity. At water temperatures (∼7 C), ridge formation was extensively reduced or completely eliminated. The transmission micrographs of sputtered films at liquid nitrogen temperatures revealed a continuous featureless film. The electron diffraction patterns showed broad, diffused rings indicating an amorphous film. The transmission micrographs of a post annealed (425 C) MoS2 film sputtered at liquid nitrogen temperature revealed the tendency for ridge formation. Electron diff...
[1]
R. Hoffmann,et al.
Influence of Substrate Temperature on the Condensation of Vacuum Evaporated Films of MgF2 and ZnS
,
1969
.
[2]
J. Vossen.
Control of Film Properties by rf-Sputtering Techniques
,
1971
.
[3]
J. Vossen.
Contamination in Films Sputtered From Hot-Pressed Targets
,
1971
.
[4]
T. Spalvins.
Lubrication with sputtered MoS2 films
,
1971
.
[5]
T. Spalvins.
Sputtering - A vacuum deposition method for coating material.
,
1972
.
[6]
T. Spalvins.
Deposition of MoS sub 2 films by physical sputtering and their lubrication properties in vacuum.
,
1969
.
[7]
Benyebka Bou-Saïd,et al.
Non-Newtonian effects on static and dynamic performances of journal and lobed bearing
,
1969
.
[8]
M. Lavik,et al.
Evidence of Crystal Structure in Some Sputtered MoS2 Films
,
1972
.