Bulk defects in nano-crystalline and in non-crystalline HfO2-based thin film dielectrics
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M. D. Ulrich | Hyungtak Seo | Gerald Lucovsky | Jan Lüning | J. Lüning | G. Lucovsky | L. Fleming | H. Seo | Sanghyun Lee | L. B. Fleming | S. Lee | M. Ulrich
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