Sub-nanometer precision modification of the optical properties of three-dimensional polymer-based photonic crystals

Abstract We present a convenient post-fabrication technique to precisely tune the optical properties of polymer-based three-dimensional photonic crystals with sub-nanometer precision. Conventional air-plasma etching is utilized to modify the filling fraction of direct laser written polymer photonic crystals beyond the wavelength-imposed limits. Tuning of the optical properties is monitored in transmission and reflection spectroscopy. A simple model for the etching process is proposed and found to be in good agreement with the experimental observations.

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