Large area deposition of 〈100〉-textured diamond films by a 60-kW microwave plasma CVD reactor
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T. Tachibana | Y. Yokota | K. Kobashi | T. Hirao | K. Oura | Y. Ando | A. Watanabe | Y. Nishibayashi
暂无分享,去创建一个
T. Tachibana | Y. Yokota | K. Kobashi | T. Hirao | K. Oura | Y. Ando | A. Watanabe | Y. Nishibayashi