Al‐Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors
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Cheol Seong Hwang | Seungwu Han | Jeong Hwan Han | C. Hwang | Seungwu Han | S. Kim | G. Choi | Sang Young Lee | Minha Seo | Sang Woon Lee | J. Han | H. Ahn | Seong Keun Kim | Gyu-Jin Choi | Sang Young Lee | Minha Seo | Sang Woon Lee | Hyo-Shin Ahn
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