Carbonaceous contamination growth induced by resist outgassing under e-beam exposure
暂无分享,去创建一个
L. Pain | Marie-Line Pourteau | Marco Jan-Jaco Wieland | Sylvain David | Armel-Petit Mebiene-Engohang | Jean-Christophe Marusic | Marc Smits
[1] L. Pain,et al. Investigation of the resist outgassing and hydrocarbonaceous contamination induced in multi-electron-beam lithography tools , 2014, Advanced Lithography.
[2] G. de Boer,et al. MAPPER: progress toward a high-volume manufacturing system , 2013, Advanced Lithography.
[3] Yasushi Nishiyama,et al. Carbon contamination of EUV mask: film characterization, impact on lithographic performance, and cleaning , 2008, SPIE Advanced Lithography.
[4] R. W. Christy,et al. Formation of Thin Polymer Films by Electron Bombardment , 1960 .
[5] Michiel van Beek,et al. Radiation-induced carbon contamination of optics , 2002, SPIE Advanced Lithography.
[6] K. M. Poole. Electrode Contamination in Electron Optical Systems , 1953 .
[7] A. Ennos,et al. The sources of electron-induced contamination in kinetic vacuum systems , 1954 .
[8] Laurent Pain,et al. Direct write lithography: the global solution for R&D and manufacturing , 2006 .
[9] W. Jark,et al. Investigation of carbon contamination of mirror surfaces exposed to synchrotron radiation , 1983 .
[10] R. Gronheid,et al. Characterization of EUV optics contamination due to photoresist related outgassing , 2010, Advanced Lithography.