论文信息 - Chloride Based CVD of 3C-SiC on (0001) α-SiC Substrates

Chloride Based CVD of 3C-SiC on (0001) α-SiC Substrates

A chloride-based chemical-vapor-deposition (CVD) process has been successfully used to grow very high quality 3C-SiC epitaxial layers on on-axis α-SiC substrates. An accurate process parameters study was performed testing the effect of temperature, in situ surface preparation, precursor ratios, nitrogen addition, and substrate polytype and polarity. The 3C layers deposited showed to be largely single-domain material of very high purity and of excellent electrical characteristics. A growth rate of up to 10 µm/h and a low background doping enable deposition of epitaxial layers suitable for MOSFET devices.

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