Characterization of the synchrotron-based 0.3-NA EUV microexposure tool at the ALS Patrick Naulleau 1 , Kenneth A. Goldberg 2 , Erik Anderson 2 , Kim Dean 3 , Paul Denham 2 , Jason P. Cain 4 , Brian Hoef 2 , Keith Jackson 2 College of Nanoscale Science and Engineering, University at Albany, NY 12220 Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA 94720 SEMATECH, Austin, TX 78741 EECS Department, University of California, Berkeley, CA 94720 Abstract Synchrotron-based EUV exposure tools continue to play a crucial roll in the development of EUV lithography. Utilizing a programmable-pupil-fill illuminator, the 0.3-NA microexposure tool at Lawrence Berkeley National Laboratory’s Advanced Light Source synchrotron radiation facility provides the highest resolution EUV projection printing capabilities available today. This makes it ideal for the characterization of advanced resist and mask processes. The Berkeley tool also serves as a good benchmarking platform for commercial implementations of 0.3-NA EUV microsteppers because its illuminator can be programmed to emulate the coherence conditions of the commercial tools. Here we present the latest resist and tool characterization results from the Berkeley EUV exposure station. 1. Introduction For volume nanoelectronics production using Extreme ultraviolet (EUV) lithography [1] to become a reality around the year 2011, advanced research tools are required today. Initial production tools are expected to have numerical apertures (NA) of 0.25 and be used for the 32- nm node. Relevant developmental systems thus also require NAs of 0.25 or higher. To meet the need for early development tools, microfield exposure systems trading off field size and speed for greatly reduced complexity have been developed. Similar microfield tools have been crucial Contact: Patrick Naulleau University at Albany, College of Nanoscale Science and Engineering, 255 Fuller Rd., Nanofab South, Albany, NY 12203 Tel: 518-437-8686 | Fax: 518-437-8603 | Email: Pnaulleau@uamail.albany.edu