Microstructure optimization and optical and interfacial properties modulation of sputtering-derived HfO2 thin films by TiO2 incorporation
暂无分享,去创建一个
J. Zhang | J. Lv | X. Chen | G. He | L. Zhou | B. Deng | Z. Q. Sun | Hong Chen | Xi-Bao Chen | Z. Sun
[1] K. Boubaker,et al. Study of nickel doping effects on structural, electrical and optical properties of sprayed ZnO semiconductor layers , 2014 .
[2] Shuyi Ma,et al. Effects of substrate temperature on the growth orientation and optical properties of ZnO:Fe films synthesized via magnetron sputtering , 2013 .
[3] H. H. Güllü,et al. Structural and optical properties of Zn–In–Te thin films deposited by thermal evaporation technique , 2013 .
[4] P. P. Sahay,et al. Influence of In doping on the structural, optical and acetone sensing properties of ZnO nanoparticulate thin films , 2013 .
[5] R. Chand,et al. Structural and dielectric properties of Ti and Er co-doped HfO2 gate dielectrics grown by RF sputtering , 2013 .
[6] Ananthakumar Ramadoss,et al. Synthesis and characterization of HfO2 nanoparticles by sonochemical approach , 2012 .
[7] Cheol-Eui Lee,et al. Modification of the optical properties of ZnO thin films by proton implantation , 2012 .
[8] A. Boukhachem,et al. Structural, opto-thermal and electrical properties of ZnO:Mo sprayed thin films , 2012 .
[9] S. Kose,et al. Some physical properties of In doped copper oxide films produced by ultrasonic spray pyrolysis , 2012 .
[10] Vikram Singh,et al. Study of rapid thermal annealing on ultra thin high-k HfO2 films properties for nano scaled MOSFET technology , 2012 .
[11] Tao Yu,et al. The structure and electrical properties of HfTaON high-k films prepared by DIBSD , 2012 .
[12] Y. M. Liu,et al. Composition dependence of interface control and optimization on the performance of an HfTiON gate dielectric metal-oxide-semiconductor capacitor , 2011 .
[13] R. Turan,et al. Effects of physical growth conditions on the structural and optical properties of sputtered grown thin HfO2 films , 2011 .
[14] S. Kose,et al. Optical, structural and surface characterization of ultrasonically sprayed CdO:F films , 2011 .
[15] C. Aita,et al. Optical absorption at its onset in sputter deposited hafnia-titania nanolaminates , 2010 .
[16] Y. Xiong,et al. Electrical characteristics of MOS capacitor using amorphous Gd2O3-doped HfO2 insulator , 2010 .
[17] V. Kaichev,et al. Interfaces analysis of the HfO2/SiO2/Si structure , 2010 .
[18] Albena Paskaleva,et al. High-k HfO2-Ta2O5 mixed layers: Electrical characteristics and mechanisms of conductivity , 2010 .
[19] Jun Du,et al. Cube-on-cube epitaxy of Gd2O3-doped HfO2 films on Si(1 0 0) substrates by pulse laser deposition , 2009 .
[20] Tingting Tan,et al. Chemical structure and electrical properties of sputtered HfO2 films on Si substrates annealed by rapid thermal annealing , 2009 .
[21] M. Hassan,et al. Ellipsometric characterization of PbI2 thin film on glass , 2009 .
[22] F. A. Kuznetsov,et al. Composition and structure of hafnia films on silicon , 2008 .
[23] C. Aita,et al. Mixed cation phases in sputter deposited HfO2–TiO2 nanolaminates , 2008 .
[24] P. T. Lai,et al. Effects of Ti content and wet-N2 anneal on Ge MOS capacitors with HfTiO gate dielectric , 2008, Microelectron. Reliab..
[25] M. Raymond,et al. Impact of titanium addition on film characteristics of HfO2 gate dielectrics deposited by atomic layer deposition , 2005 .
[26] C. K. Maiti,et al. Ge-channel p-MOSFETs with ZrO2 gate dielectrics , 2005 .
[27] L. Zhang,et al. Effect of postdeposition annealing on the thermal stability and structural characteristics of sputtered HfO2 films on Si(100) , 2005 .
[28] G. He,et al. The structural and interfacial properties of HfO2/Si by the plasma oxidation of sputtered metallic Hf thin films , 2004 .
[29] M. Li,et al. Electrical conduction and band offsets in Si/HfxTi1−xO2/metal structures , 2004 .
[30] S. Y. Kim,et al. Spectroscopic ellipsometry characterization of Al-doped ZnO thin films deposited by pulsed laser deposition , 2004 .
[31] S. Campbell,et al. A study of mixtures of HfO 2 and TiO 2 as high- k gate dielectrics , 2004 .
[32] M. Girtan,et al. Structural and optical properties of indium oxide thin films prepared by an ultrasonic spray CVD process , 2003 .