论文信息 - Precursors for p-Type Nickel Oxide: Atmospheric-Pressure Metal–Organic Chemical-Vapour Deposition (MOCVD) of Nickel Oxide Thin Films with High Work Functions - 字舞流文

Precursors for p-Type Nickel Oxide: Atmospheric-Pressure Metal–Organic Chemical-Vapour Deposition (MOCVD) of Nickel Oxide Thin Films with High Work Functions

Andrew L. Johnson | M. Hill | K. Molloy, | T. Manning | S. Richards | Stephen P Richards | S. Cosham | K. Molloy | A. Johnson | Samuel D. Cosham