Ellipsometric liquid immersion method for the determination of all the optical parameters of the system: Nonabsorbing film on an absorbing substrate☆
暂无分享,去创建一个
[1] F. Lukes̆,et al. Ellipsometric method for the determination of all the optical parameters of the system of an isotropic nonabsorbing film on an isotropic absorbing substrate - Optical constants of silicon. , 1969 .
[2] J. Sládková. Thin oxide films on germanium , 1968 .
[3] R. Srinivasan,et al. Simultaneous and Independent Determination of the Refractive Index and the Thickness of Thin Films by Ellipsometry , 1968 .
[4] M. Cohen,et al. Ellipsometry in the Measurement of Surfaces and Thin Films , 1965 .
[5] H. E. Bennett,et al. Effect of a Thin Surface Film on the Ellipsometric Determination of Optical Constants , 1964 .
[6] A. Revesz,et al. Ellipsometric investigations of oxide films on Ga As , 1964 .
[7] R. J. Archer. Determination of the Properties of Films on Silicon by the Method of Ellipsometry , 1962 .
[8] Nicholas Chako,et al. Optics of thin films , 1960 .