High-intensity laser processing of thin films

We use high intensity nanosecond laser pulses of different wavelengths to modify thin film coatings (silica and titania) on the surface of silicon. We find that films as thick as 1 micron can be removed from the surface in one shot with minor or no damage to the Si surface. We also find the accumulated effect of multiple pulse irradiation. Finally we report our preliminary results on phase transformations in titania films induced by high intensity laser.