Instrumentation for XUV lithography at SURF-II

Abstract A new beam line for X-ray lithography with photon energies near 100 eV has been installed on the SURF-II storage ring at the National Bureau of Standards. Vacuum isolation of the ring from the exposure chamber is achieved using both a thin carbon window and a baffle cooled to liquid nitrogen temperature. The design and performance of the beam line are described. Initial exposures of two photoresists of intermediate sensitivity show that the beam line will serve for production of test microcircuits.