论文信息 - Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111) - 字舞流文

Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)

Michael D. Detwiler | R. Reifenberger | F. Ribeiro | J. Greeley | W. Delgass | D. Zemlyanov | Xiang-Kui Gu | B. Klötzer | L. Mayr | A. Gharachorlou | Lukas Mayr | Xiang-kui Gu