Optical Characterization and Defect inspection for 3D stacked IC technology

Advanced packaging technologies are rapidly evolving and 3D architectures requires new inspection and metrology techniques. Existing techniques need to be improved but new techniques must be developed to address new challenges induced by the last fabrication processes. To increase the development speed, it is a big advantage that metrology and defect inspection need to be present on the same platform and a flexible tool, with multi sensors, to be more versatile facing the different step of the process will be presented in this paper As 3D IC devices utilize TSVs for direct interconnect, the depth, top and bottom CD (critical diameter) of such TSVs with a diameter as small as 5 μm with a high aspect ratio is characterized. During wafer temporary bounding, which is an handling technique that allows wafer thinning with a thickness of less than 100 μm, by selecting the most sensitive sensor, determination of the thickness of each layer of the stack could be determined at the same time: silicon substrate, thin...

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