A review of techniques for polishing and planarizing chemically vapor-deposited (CVD) diamond films and substrates

Abstract State-of-the-art polycrystalline chemically vapor-deposited (CVD) diamond films and substrates have rough surfaces and non-uniform thicknesses which can adversely affect their application. Polishing and planarization can be used to remedy these drawbacks. In recent years, many polishing and planarization techniques have been reported, each having technological advantages and disadvantages. A specific polishing technique should be chosen based on these advantages and disadvantages, depending on the particular CVD diamond film application. Polishing and planarization techniques are reviewed in this paper. Parameters considered include polishing rate, surface finish requirements, and economic impact. To aid in the understanding and evaluation of diamond polishing techniques for applications, polishing mechanisms are also reviewed. Finally, CVD diamond applications and their surface roughness requirements are presented.

[1]  J. Field,et al.  Solid particle impact of CVD diamond films , 1992 .

[2]  G. Amaratunga,et al.  Defined etching of carbon-diamond films on silicon using an oxygen plasma with titanium masking , 1992 .

[3]  W. Chu,et al.  Reactive ion etching of diamond , 1989 .

[4]  A. V. Kuzmichov,et al.  LASER PROCESSING OF DIAMOND AND DIAMOND-LIKE FILMS , 1993 .

[5]  T. Sugita,et al.  Planning of synthetic diamond film by the Penning discharge microsputtering method , 1991 .

[6]  D. Yoon,et al.  Metallographic etching of polycrystalline diamond films by reaction with metal , 1995 .

[7]  E. N. Loubnin,et al.  Fine patterning of diamond films by laser-assisted chemical etching in oxygen , 1995 .

[8]  M. Hashish,et al.  Polishing of CVD diamond films with abrasive liquidjets: an exploratoryinvestigation , 1992, Optics & Photonics.

[9]  J. M. Meese,et al.  Plasma etched polycrystalline hot‐filament chemical vapor deposited diamond thin films and their electrical characteristics , 1994 .

[10]  Masanori Yoshikawa,et al.  Development and performance of a diamond-film polishing apparatus with hot metals , 1990, Optics & Photonics.

[11]  James E. Butler,et al.  Growth, polishing, and optical scatter of diamond thin films , 1990, Optics & Photonics.

[12]  H. C. Ong,et al.  Development of flat, smooth (100) faceted diamond thin films using microwave plasma chemical vapor deposition , 1997 .

[13]  Bertrand G. Bovard,et al.  Diamond film polishing with argon and oxygen ion beams , 1990, Optics & Photonics.

[14]  J. Dismukes,et al.  Synthetic diamond: emerging CVD science and technology , 1994 .

[15]  M. Yanagisawa,et al.  Mechanical properties of diamondlike carbon films , 1989 .

[16]  A. Feldman,et al.  Diamond Optics III , 1990 .

[17]  H A Macleod,et al.  Oxygen-ion beam polishing of a 5-cm-diameter diamond film. , 1992, Applied optics.

[18]  A. A. Smolin,et al.  UV laser processing of diamond films: effects of irradiation conditions on the properties of laser-treated diamond film surfaces , 1993 .

[19]  H. Pierson.  Handbook of carbon, graphite, diamond, and fullerenes , 1992 .

[20]  Kazuaki Kurihara,et al.  High rate synthesis of diamond by dc plasma jet chemical vapor deposition , 1988 .

[21]  K. E. Spear.  Diamond—Ceramic Coating of the Future , 1989 .

[22]  Leonard M. Hanssen,et al.  Diamond synthesis using an oxygen-acetylene torch , 1988 .

[23]  G. Turban,et al.  Surface smoothing of diamond membranes by reactive ion etching process , 1996 .

[24]  S. Ojha,et al.  Deposition of hard and insulating carbonaceous films on an r.f. target in a butane plasma , 1976 .

[25]  S. G. Kosinski,et al.  Massive thinning of diamond films by a diffusion process , 1992 .

[26]  H. Macleod,et al.  Planarizing technique for ion-beam polishing of diamond films. , 1992, Applied optics.

[27]  David C. Ingram,et al.  Cold field emission from CVD diamond films observed in emission electron microscopy , 1991 .

[28]  H. Buchkremer‐Hermanns,et al.  ECR plasma polishing of CVD diamond films , 1996 .

[29]  T. Tamamura,et al.  Amorphous carbon films as resist masks with high reactive ion etching resistance for nanometer lithography , 1986 .

[30]  Mordechai Rothschild,et al.  Excimer‐laser etching of diamond and hard carbon films by direct writing and optical projection , 1986 .

[31]  A. Smolin,et al.  Smoothening of diamond films with an ArF laser , 1992 .

[32]  Hugh O. Pierson,et al.  Handbook of carbon, graphite, diamond, and fullerenes : properties, processing, and applications , 1993 .

[33]  Alan B. Harker,et al.  Polishing of polycrystalline diamond films , 1990, Optics & Photonics.

[34]  R. Singh,et al.  Excimer laser-assisted planarization of thick diamond films , 1996 .

[35]  M. G. Jubber,et al.  Modelling of self-limiting laser ablation of rough surfaces: application to the polishing of diamond films , 1995 .

[36]  D. Wiechert,et al.  Post-depositional diamond etching , 1993 .

[37]  Sidney Singer.  The Potential Of Diamond As A Very High Average Power Transmitting Optical Material , 1989, Optics & Photonics.

[38]  Albert Feldman,et al.  Applications of diamond films and related materials , 1995 .

[39]  I. Yoshida,et al.  Effect of oxygen addition on microwave plasma CVD of diamond from CH4-H2 mixture , 1989 .

[40]  A. Malshe,et al.  A preliminary investigation of the effect of post-deposition polishing of diamond films on the machining behavior of diamond-coated cutting tools , 1995 .

[41]  S. Matsumoto,et al.  Diamond synthesis from gas phase in microwave plasma , 1983 .

[42]  Masanori Yoshikawa,et al.  Smoothing of chemically vapour deposited diamond films by ion beam irradiation , 1992 .