Employing a detailed compositional analysis to develop a low defect Mo/Si deposition tool and process for EUVL mask blanks
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Toshiyuki Uno | Andy Ma | Eberhard Spiller | Rajul Randive | Paul Mirkarimi | Patrick Kearney | San-In Han | Soon-Cheon Seo | Dave Krick
[1] P. Silverman. Extreme ultraviolet lithography: overview and development status , 2005 .
[2] Cindy C. Larson,et al. Advances in low-defect multilayers for EUVL mask blanks , 2002, SPIE Advanced Lithography.
[3] Andy Ma,et al. Current status of next-generation EUVL mask blank tool development , 2003, SPIE Photomask Technology.
[4] Andy Ma,et al. Overcoming substrate defect decoration effects in EUVL mask blank development , 2004, SPIE Photomask Technology.
[5] Scott Daniel Hector,et al. Extreme ultraviolet lithography: reflective mask technology , 2000, Advanced Lithography.