论文信息 - Formation of a-Si:H Film by p-CVD Method with SiH4-He Mixture and its Opto-Electronic Properties - 字舞流文

Formation of a-Si:H Film by p-CVD Method with SiH4-He Mixture and its Opto-Electronic Properties

T. Yamaguchi | Y. Nakamura | A. Okagawa

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