Tailored voltage waveform capacitively coupled plasmas in electronegative gases: frequency dependence of asymmetry effects

Capacitively coupled radio frequency plasmas operated in an electronegative gas (CF4) and driven by voltage waveforms composed of four consecutive harmonics are investigated for different fundamental driving frequencies using PIC/MCC simulations and an analytical model. As has been observed previously for electropositive gases, the application of peak-shaped waveforms (that are characterized by a strong amplitude asymmetry) results in the development of a DC self-bias due to the electrical asymmetry effect (EAE), which increases the energy of ions arriving at the powered electrode. In contrast to the electropositive case (Korolov et al 2012 J. Phys. D: Appl. Phys. 45 465202) the absolute value of the DC self-bias is found to increase as the fundamental frequency is reduced in this electronegative discharge, providing an increased range over which the DC self-bias can be controlled. The analytical model reveals that this increased DC self-bias is caused by changes in the spatial profile and the mean value of the net charge density in the grounded electrode sheath. The spatio-temporally resolved simulation data show that as the frequency is reduced the grounded electrode sheath region becomes electronegative. The presence of negative ions in this sheath leads to very different dynamics of the power absorption of electrons, which in turn enhances the local electronegativity and plasma density via ionization and attachment processes. The ion flux to the grounded electrode (where the ion energy is lowest) can be up to twice that to the powered electrode. At the same time, while the mean ion energies at both electrodes are quite different, their ratio remains approximately constant for all base frequencies studied here.

[1]  E. Schüngel,et al.  Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF4 , 2016 .

[2]  E. Schüngel,et al.  Slope and amplitude asymmetry effects on low frequency capacitively coupled carbon tetrafluoride plasmas , 2016 .

[3]  J. Booth,et al.  Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms , 2016 .

[4]  D. J. Economou,et al.  Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4 , 2016 .

[5]  J. Schulze,et al.  Electron heating via self-excited plasma series resonance in geometrically symmetric multi-frequency capacitive plasmas , 2015, 1602.03853.

[6]  You-nian Wang,et al.  Heating mode transition in capacitively coupled CF4 discharges: comparison of experiments with simulations , 2015 .

[7]  E. Schüngel,et al.  Power supply and impedance matching to drive technological radio-frequency plasmas with customized voltage waveforms. , 2015, The Review of scientific instruments.

[8]  J. Booth,et al.  Strong ionization asymmetry in a geometrically symmetric radio frequency capacitively coupled plasma induced by sawtooth voltage waveforms. , 2015, Physical review letters.

[9]  U. Czarnetzki,et al.  Prevention of ion flux lateral inhomogeneities in large area capacitive radio frequency plasmas via the electrical asymmetry effect , 2015 .

[10]  J. Röpcke,et al.  Evaluation of the Electrical Asymmetry Effect by spectroscopic measurements of capacitively coupled discharges and silicon thin film depositions , 2015 .

[11]  J. Booth,et al.  Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms , 2014 .

[12]  D. J. Economou,et al.  Radio-frequency capacitively coupled plasmas in hydrogen excited by tailored voltage waveforms: comparison of simulations with experiments , 2014 .

[13]  J. Schulze,et al.  The effect of ambipolar electric fields on the electron heating in capacitive RF plasmas , 2014, 1602.01719.

[14]  J. Maurice,et al.  Effect of Ion Energy on Microcrystalline Silicon Material and Devices: A Study Using Tailored Voltage Waveforms , 2014, IEEE Journal of Photovoltaics.

[15]  D. Coumou,et al.  Ion Energy Distribution Skew Control Using Phase-Locked Harmonic RF Bias Drive , 2014, IEEE Transactions on Plasma Science.

[16]  You-nian Wang,et al.  Heating mode transition in a hybrid direct current/dual-frequency capacitively coupled CF4 discharge , 2014 .

[17]  P. Awakowicz,et al.  On the electrical asymmetry effect in large area multiple frequency capacitively coupled plasmas , 2014 .

[18]  J. Schulze,et al.  Electron heating and control of ion properties in capacitive discharges driven by customized voltage waveforms , 2013, 2014 IEEE 41st International Conference on Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS).

[19]  U. Czarnetzki,et al.  Field reversals in electrically asymmetric capacitively coupled radio-frequency discharges in hydrogen , 2013 .

[20]  R. Schneider,et al.  Observation of Ω mode electron heating in dusty argon radio frequency discharges , 2013 .

[21]  U. Czarnetzki,et al.  The effect of dust on electron heating and dc self-bias in hydrogen diluted silane discharges , 2013 .

[22]  U. Czarnetzki,et al.  The effect of the driving frequencies on the electrical asymmetry of dual-frequency capacitively coupled plasmas , 2012 .

[23]  U. Czarnetzki,et al.  Fundamental investigations of capacitive radio frequency plasmas: simulations and experiments , 2012 .

[24]  J. Meichsner,et al.  Dynamics and Electronegativity of Oxygen RF Plasmas , 2012 .

[25]  H. Wagner,et al.  Surface charge accumulation and discharge development in diffuse and filamentary barrier discharges operating in He, N2 and mixtures , 2012 .

[26]  M. Kushner,et al.  Control of electron energy distributions and plasma characteristics of dual frequency, pulsed capacitively coupled plasmas sustained in Ar and Ar/CF4/O2 , 2012 .

[27]  J. Booth,et al.  Separate control of the ion flux and ion energy in capacitively coupled radio-frequency discharges using voltage waveform tailoring , 2012 .

[28]  S. Pouliquen,et al.  Hydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring , 2012 .

[29]  J. Booth,et al.  Microcrystalline silicon solar cells deposited using a plasma process excited by tailored voltage waveforms , 2012 .

[30]  J. Schulze,et al.  Ionization by drift and ambipolar electric fields in electronegative capacitive radio frequency plasmas. , 2011, Physical review letters.

[31]  J. Schulze,et al.  Electron heating and the electrical asymmetry effect in dual-frequency capacitive CF4 discharges , 2011 .

[32]  U. Czarnetzki,et al.  The electrical asymmetry effect in multi-frequency capacitively coupled radio frequency discharges , 2011 .

[33]  Pascal Chabert,et al.  Physics of radio-frequency plasmas , 2011 .

[34]  U. Czarnetzki,et al.  Power absorption in electrically asymmetric dual frequency capacitive radio frequency discharges , 2011 .

[35]  U. Czarnetzki,et al.  The electrical asymmetry effect in capacitively coupled radio-frequency discharges , 2011 .

[36]  D. Voloshin,et al.  Two modes of capacitively coupled rf discharge in CF4 , 2010 .

[37]  R. Schneider,et al.  Excitation Mechanisms and Sheath Dynamics in Capacitively Coupled Radio‐Frequency Oxygen Plasmas , 2010 .

[38]  U. Czarnetzki,et al.  Charge dynamics in capacitively coupled radio frequency discharges , 2010 .

[39]  V. Schulz-von der Gathen,et al.  The challenge of revealing and tailoring the dynamics of radio-frequency plasmas , 2010 .

[40]  U. Czarnetzki,et al.  Different modes of electron heating in dual-frequency capacitively coupled radio frequency discharges , 2009 .

[41]  U. Czarnetzki,et al.  The electrical asymmetry effect in capacitively coupled radio frequency discharges – measurements of dc self bias, ion energy and ion flux , 2009 .

[42]  S. H. Lee,et al.  Control of ion energy distribution in low-pressure and triple-frequency capacitive discharge , 2009 .

[43]  U. Czarnetzki,et al.  Stochastic heating in asymmetric capacitively coupled RF discharges , 2008 .

[44]  U. Czarnetzki,et al.  On the possibility of making a geometrically symmetric RF-CCP discharge electrically asymmetric , 2008 .

[45]  U. Czarnetzki,et al.  Electric field reversals in the sheath region of capacitively coupled radio frequency discharges at different pressures , 2008 .

[46]  David Tskhakaya,et al.  Particle in Cell Simulation of Low Temperature Laboratory Plasmas , 2007 .

[47]  R. Brinkmann Beyond the step model: Approximate expressions for the field in the plasma boundary sheath , 2007 .

[48]  R. Faulkner,et al.  Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas , 2006 .

[49]  A. Bogaerts,et al.  Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model , 2006 .

[50]  V. Zhaunerchyk,et al.  The dissociative recombination of fluorocarbon ions III: CF+2 and CF+3 , 2006 .

[51]  J. Verboncoeur Particle simulation of plasmas: review and advances , 2005 .

[52]  A. Lichtenberg,et al.  Principles of Plasma Discharges and Materials Processing: Lieberman/Plasma 2e , 2005 .

[53]  A. Ellingboe,et al.  Electrostatic modelling of dual frequency rf plasma discharges , 2004 .

[54]  A. Bogaerts,et al.  Numerical investigation of ion-energy-distribution functions in single and dual frequency capacitively coupled plasma reactors. , 2004, Physical review. E, Statistical, nonlinear, and soft matter physics.

[55]  A. Bogaerts,et al.  Numerical study of Ar/CF4/N2 discharges in single- and dual-frequency capacitively coupled plasma reactors , 2003 .

[56]  A. Bogaerts,et al.  Particle-in-cell/Monte Carlo simulation of a capacitively coupled radio frequency Ar/CF4 discharge: Effect of gas composition , 2003 .

[57]  K. Steffens,et al.  Effect of changing the electrode gap on the spatial and electrical properties of O2/CF4 plasmas , 2003 .

[58]  D. Vender,et al.  Collisionless electron heating by capacitive rf sheaths. , 2001, Physical review letters.

[59]  T. Makabe,et al.  Transport coefficients and scattering cross-sections for plasma modelling in CF4-Ar mixtures: a swarm analysis , 2000 .

[60]  T. Kitajima Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma , 2000 .

[61]  K. Nanbu,et al.  Probability theory of electron-molecule, ion-molecule, molecule-molecule, and Coulomb collisions for particle modeling of materials processing plasmas and cases , 2000 .

[62]  K. Nanbu,et al.  Self-Consistent Particle Simulation of Radio Frequency CF4Discharge: Effect of Gas Pressure , 2000 .

[63]  A. Bogaerts,et al.  Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: Comparison between Ar and SiH4 , 2000 .

[64]  Kazuki Denpoh Kazuki Denpoh,et al.  Self-Consistent Particle Simulation of Radio Frequency CF4 Discharge: Effect of Gas Pressure , 2000 .

[65]  T. Makabe,et al.  Dependence of Driving Frequency on Capacitively Coupled Plasma in CF4 , 1999 .

[66]  U. Czarnetzki,et al.  Space and time resolved electric field measurements in helium and hydrogen RF-discharges , 1999 .

[67]  Michael A. Lieberman,et al.  From Fermi acceleration to collisionless discharge heating , 1998 .

[68]  K. Nanbu,et al.  Monte Carlo Collision Simulation of Positive-Negative Ion Recombination for a Given Rate Constant , 1998 .

[69]  C. Mahony,et al.  Sheath dynamics observed in a 13.56 MHz-driven plasma , 1997 .

[70]  T. Makabe,et al.  Influence of driving frequency on narrow-gap reactive-ion etching in SF6 , 1995 .

[71]  A. Lichtenberg,et al.  Principles of Plasma Discharges and Materials Processing , 1994 .

[72]  R. Bonham Electron Impact Cross Section Data for Carbon Tetrafluoride. , 1994 .

[73]  J. Boeuf,et al.  Transition from a capacitive to a resistive regime in a silane radio frequency discharge and its possible relation to powder formation , 1992 .

[74]  A. Viggiano,et al.  Chemistry of CFn+ (n = 1-3) ions with halocarbons , 1992 .

[75]  J. Perrin,et al.  Spatially resolved optical emission and electrical properties of SiH4 RF discharges at 13.56 MHz in a symmetric parallel-plate configuration , 1991 .

[76]  Charles K. Birdsall,et al.  Particle-in-cell charged-particle simulations, plus Monte Carlo collisions with neutral atoms, PIC-MCC , 1991 .

[77]  Graves,et al.  Electron acoustic waves in capacitively coupled, low-pressure rf glow discharges. , 1991, Physical review letters.

[78]  T. Makabe,et al.  Study of the structure in rf glow discharges in SiH4/H2 by spatiotemporal optical emission spectroscopy: Influence of negative ions , 1990 .

[79]  R. Boswell,et al.  Numerical modeling of low-pressure RF plasmas , 1990 .

[80]  Boeuf,et al.  Transition between different regimes of rf glow discharges. , 1990, Physical review. A, Atomic, molecular, and optical physics.

[81]  V. M. Donnelly,et al.  Anisotropic etching of SiO2 in low‐frequency CF4/O2 and NF3/Ar plasmas , 1984 .