Reactions of silane with the W(110) surface

[1]  P. Berlowitz,et al.  Growth and atomic structure of chromium overlayers on W(110) and W(100) , 1989 .

[2]  S. Gates,et al.  Reactive sticking coefficient of silane on the Si(111)-(7×7) Surface , 1989 .

[3]  T. E. Clark.  Characterization and optimization of low‐pressure chemical vapor deposited tungsten silicide using screening and response surface experimental designs , 1988 .

[4]  J. L. Grant,et al.  Adsorption of boron on molybdenum(100) and its effect on chemisorption of carbon monoxide, ethene, propene, and 3,3,3-trifluoropropene , 1987 .

[5]  G. Rossi.  d and f metal interface formation on silicon , 1987 .

[6]  D. Young,et al.  Silicide coatings for carburization protection , 1987 .

[7]  E. Shustorovich.  Chemisorption phenomena: Analytic modeling based on perturbation theory and bond-order conservation , 1986 .

[8]  C. Peden,et al.  THE REACTION OF ATOMIC COPPER WITH CHEMISORBED HYDROGEN ON RUTHENIUM , 1985 .

[9]  G. Ottaviani,et al.  Electronic properties on silicon-transition metal interface compounds , 1985 .

[10]  S. Ossicini,et al.  AES analysis of the growth mechanism of metal layers on metal surfaces , 1985 .

[11]  Kleinman,et al.  Self-consistent semirelativistic energy bands of WSi2. , 1985, Physical review. B, Condensed matter.

[12]  T. Matsushima,et al.  CO adsorption on si-covered polycrystalline tungsten surfaces , 1984 .

[13]  T. Rhodin,et al.  Angle resolved photoemission study of the c(2 × 2)Si overlayer on Fe(100) , 1984 .

[14]  R. Nuzzo,et al.  Reactivity of intermetallic thin films formed by the surface mediated decomposition of main group organometallic compounds , 1984 .

[15]  G. Rubloff.  MICROSCOPIC PROPERTIES AND BEHAVIOR OF SILICIDE INTERFACES , 1983 .

[16]  Y. Tsunashima,et al.  Atom-probe study of the initial stage of silicide formation , 1983 .

[17]  A. Thanailakis,et al.  Hydrogen adsorption on silicon (1 1 1) surfaces studied by Auger electron spectroscopy , 1982 .

[18]  Leonard J. Brillson,et al.  The structure and properties of metal-semiconductor interfaces , 1982 .

[19]  R. Bauer,et al.  The role of silicon in corrosion-resistant high temperature coatings , 1982 .

[20]  T. Tsong,et al.  Direct observation of atomic processes: Silicon adatoms on tungsten surfaces☆ , 1982 .

[21]  H. Fink,et al.  Surface science lettersDirect observation of overlayer structures on W(110) , 1981 .

[22]  H. H. Madden.  Hydrogen chemisorption on silicon (100) 2 × 1 , 1981 .

[23]  M. Sinha,et al.  Field Emission Study of Silicon on Tungsten , 1972 .

[24]  P. Ownby,et al.  Observations on Bayard–Alpert Ion Gauge Sensitivities to Various Gases , 1971 .

[25]  A. Cassuto,et al.  Low-pressure, high-temperature siliconizing of tungsten-I , 1971 .

[26]  Robert L. Park,et al.  Annealing changes on the (100) surface of palladium and their effect on CO adsorption , 1968 .

[27]  B. Cullity,et al.  Elements of X-ray diffraction , 1957 .

[28]  D. H. Templeton,et al.  The Crystal Structure of Cr5Si3 , 1956 .

[29]  W. M. Haynes.  CRC Handbook of Chemistry and Physics , 1990 .

[30]  W. J. Choyke,et al.  Alkyl radical involvement in silicon surface chemistry , 1987 .

[31]  R. Nuzzo,et al.  An XPS study of the reaction of silane with oxidized copper, silver, and gold surfaces , 1985 .

[32]  R. Nuzzo,et al.  The decomposition of silane and germane on Ni(111): Implications for heterogeneous catalysis , 1985 .

[33]  R. Nuzzo,et al.  Derivatized, high surface area, supported nickel catalysts , 1984 .

[34]  A. Hiraki.  Low temperature reactions at Si/metal interfaces; What is going on at the interfaces? , 1983 .

[35]  F. d'Heurle,et al.  AN INTERFACE – MARKER TECHNIQUE APPLIED TO THE STUDY OF METAL SILICIDE GROWTH , 1980 .

[36]  Gerhard Ertl,et al.  Low Energy Electrons and Surface Chemistry , 1974 .

[37]  R. C. Weast.  CRC Handbook of Chemistry and Physics , 1973 .

[38]  L. Schmidt,et al.  Binding States of Hydrogen on Tungsten , 1971 .

[39]  H. Neumann.  Die Adsorption von Silizium auf Wolfram , 1966 .

[40]  L. Pauling.  The Nature Of The Chemical Bond , 1939 .