Influence of the oxygen concentration of atomic-layer-deposited HfO2 films on the dielectric property and interface trap density
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Cheol Seong Hwang | Moonju Cho | Tae Joo Park | C. Hwang | Jaehoon Park | S. Kim | S. Lee | T. Park | Moonju Cho | Jaehoo Park | Seong Keun Kim | Suk Woo Lee | Sug Hun Hong | S. Hong
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