Enhancement of ALCVD TM TiN growth on Si-O-C and α-SiC:H films by O 2 -based plasma treatments
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O. Richard | H. Bender | A. Satta | K. Maex | T. Conard | A. Vantomme | M. Baklanov | Wei-min Li | S. Haukka | W. M. Li | Kai-Erik Elers
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