Comprehensive studies of IR to UV light intensification by nodular defects in HfO2/SiO2 multilayer mirrors

Nodular defects tend to limit laser-induced damage threshold (LIDT) of multilayer dielectric coatings frequently used for laser applications. Cross-sections of localized damage morphologies correlate well with light intensifi- cation patterns caused by defect geometries. In vast majority of studies electric field enhancement in nodular defects was investigated for infrared spectral region. In this work theoretical analysis has been extended for IR - UV range. Light intensification in HfO2/SiO2 multilayer mirror coating was studied numerically. The analysis of obtained results indicates that phenomena is very sensitive to almost every investigated parameter. It was also found that field enhancement effect can be reached within distinct material layers (either of low or high refractive index). The discussion and insights complementing existing knowledge on nodular defects were made.

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