Virtual metrology: a solution for wafer to wafer advanced process control

Virtual metrology (VM) is a novel technology to predict wafer performance from tool slate variables. Virtual metrology can enable wafer to wafer control without additional real metrology.

[1]  C. Gould.  Advanced Process Control: benefits for photolithography process control , 2002, 13th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference. Advancing the Science and Technology of Semiconductor Manufacturing. ASMC 2002 (Cat. No.02CH37259).