Quantitative depth profile analysis by direct current glow discharge time of flight mass spectrometry

Three operation modes, based on the “absolute sensitivity factor” concept, were studied in a simple laboratory-made glow discharge ion source coupled to a time of flight mass spectrometer for depth profile quantification of conductive zinc coatings. In method 1 voltage and pressure are fixed, in method 2 constant voltage and electrical current are used and method 3 resorts to using fixed electrical current and pressure. For qualitative depth profiling of steels with a coating of galfan, slightly better results were obtained using method 1. In quantitative depth profiling studies with the GD-TOFMS system, good correlation for absolute sensitivity factors was obtained when a calibration for signal intensities of analytes versus the product “sputtering rates × elemental concentrations” was tried using homogeneous reference materials of different matrices. Therefore, conversion of the experimental emission intensities obtained from the qualitative profiles into elemental concentrations and of erosion times into depths was investigated. In this vein, quantitative profiles have resulted when using the three methods investigated for galfan, electroplated ZnNi and a galvanized coating containing lead. Method 3 provided, in general terms, slightly better results than method 1 for the three coatings, while method 2 proved to be less reliable for in-depth quantitative results.

[1]  R. Pereiro,et al.  Analytical potential of a glow discharge chamber coupled to a time of flight mass spectrometer for qualitative in-depth profile analysis , 2003 .

[2]  J. Zupan,et al.  Optimization of lamp control parameters in glow discharge optical emission spectroscopy for the analysis of copper–titanium–zinc alloy using the Simplex method , 2003 .

[3]  R. Pereiro,et al.  Characterization of a simple glow discharge coupled to a time of flight mass spectrometer for in-depth profile analysis , 2002 .

[4]  R. Pereiro,et al.  Further development of a simple glow discharge source for direct solid analysis by on-axis time of flight mass spectrometry , 2002 .

[5]  A. Sanz-Medel,et al.  Critical comparison between quadrupole and time-of-flight inductively coupled plasma mass spectrometers for isotope ratio measurements in elemental speciation , 2002 .

[6]  G. Hieftje,et al.  Mass analyzers for inductively coupled plasma time-of-flight mass spectrometry , 2001 .

[7]  I. Spitsberg,et al.  Depth profile and quantitative trace element analysis of diffusion aluminided type layers on Ni-base superalloys using high-resolution glow-discharge mass spectrometry , 2001 .

[8]  R. Pereiro,et al.  In-depth profile analysis by radiofrequencyglow discharge optical emission spectrometry using pressure as variable parameter , 2001 .

[9]  R. Fuoco,et al.  Monitoring of Depth Distribution of Trace Elements by GDMS. , 2000 .

[10]  W. Harrison,et al.  Microsecond-pulsed Grimm glow discharge as a source for time-of-flight mass spectrometry , 2000 .

[11]  L. A. D. L. Heras,et al.  Investigation of mechanisms of corrosion due to diffusion of impurities by direct current glow discharge mass spectrometry depth profiling , 2000 .

[12]  R. Pereiro,et al.  In-depth quantitative analysis of conducting coatings by radiofrequency glow discharge optical emission spectrometry: influence of the source operation methodology , 2000 .

[13]  A. Bengtson,et al.  Development of a standard method for quantitative depth profile analysis of zinc‐based metallic coatings by direct current glow discharge optical emission spectroscopy , 1999 .

[14]  X. Yan,et al.  Glow discharge source interfacing to mass analyzers:  theoretical and practical considerations. , 1999, Analytical chemistry.

[15]  H. Emteborg,et al.  Analytical performance of axial inductively coupled plasma time of flight mass spectrometry (ICP-TOFMS) , 1999 .

[16]  Fumin Li,et al.  Feasibility of applying microsecond-pulse glow discharge time of flight mass spectrometry in surface depth analysis , 1998 .

[17]  W. Harrison,et al.  Diffusion, Ionization, and Sampling Processes in the Glow Discharge Source for Mass Spectrometry , 1997 .

[18]  Peng-yuan Yang,et al.  Study of a pulsed glow discharge ion source for time-of-flight mass spectrometry , 1997 .

[19]  R. Steiner,et al.  Time-of-Flight Mass Spectrometry with a Pulsed Glow Discharge Ionization Source. , 1997, Analytical chemistry.

[20]  D. Wayne Direct Determination of Trace Noble Metals (Palladium, Platinum and Rhodium) in Automobile Catalysts by Glow Discharge Mass Spectrometry , 1997 .

[21]  R. Grieken,et al.  Quantitative Analysis of Zirconium Oxide by Direct Current Glow Discharge Mass Spectrometry Using a Secondary Cathode , 1997 .

[22]  G. Hieftje,et al.  Radio-Frequency-Powered Planar-Magnetron Glow Discharge as a Source for Time-of-Flight Elemental Mass Spectrometry , 1995 .

[23]  R. Payling In search of the ultimate experiment for quantitative depth profile analysis in glow discharge optical emission spectrometry. Part II: Generalized method , 1995 .

[24]  A. Bengtson,et al.  Quantitative depth profile analysis by glow discharge , 1994 .

[25]  G. Horlick,et al.  Analysis of aluminium alloys using inductively coupled plasma and glow discharge mass spectrometry , 1994 .

[26]  R. Hutton,et al.  Optimization of quantitative depth profiling with glow discharge mass spectrometry. Part 1. Optimization studies on crater shape and time–depth conversion , 1993 .

[27]  Z. Weiss Quantitative evaluation of depth profiles analysed by glow discharge optical emission spectroscopy: analysis of diffusion processes , 1992 .

[28]  N. Jakubowski,et al.  Application of glow discharge mass spectrometry with low mass resolution for in-depth analysis of technical surface layers , 1992 .