Application of the Child-Langmuir law to magnetron discharge plasmas

In order to investigate the influence of magnetic field on magnetron plasmas, the dependence of discharge-current density (J/sub d/) on magnetic flux densities (B) perpendicular to the electric field over the whole discharge space in a magnetron apparatus with flat multi-targets has been studied. The dependencies on working gas pressures (P) and voltages (V) have been also studied in the configuration. From the experimental results, it was found that J/sub d/ was approximately proportional to B/sup 2/, P/sup 2/ and V/sup 3/2/. The sheath structure in the apparatus has been investigated as a function of B by both a probe method and a spectroscopic one. The cathode-fall thickness was roughly proportional to B/sup -1/. From a numerical analysis on kinetics of /spl gamma/ electrons emitted from the cathode surface, it was found that the dependence of J/sub d/ on B could be explained by the Child-Langmuir law, in which the sheath thickness was replaced by the equivalent electron Larmor radius. >

[1]  B. Chapman,et al.  Current-pressure transitions in a magnetically supported dc sputtering system , 1975 .

[2]  J. Musil,et al.  Unbalanced magnetrons and new sputtering systems with enhanced plasma ionization , 1991 .

[3]  A. Penfold Early days of magnetron sputtering—an enigma , 1989 .

[4]  R. Sacks,et al.  Radiative and Electrical Properties of a Planar Magnetron Glow Discharge Device , 1989 .

[5]  S. Maniv,et al.  The current‐voltage characteristic of magnetron sputtering systems , 1983 .

[6]  C. Hirose,et al.  A Theory of Electric Field and Charge Density Distributions inside a Cylindrical Hollow Cathode , 1988 .

[7]  J. Goree,et al.  Measurements of ion velocity and density in the plasma sheath , 1992 .

[8]  M. Lieberman,et al.  Axial distribution of optical emission in a planar magnetron discharge , 1988 .

[9]  S. Maniv Generalization of the model for the J‐V characteristics of dc sputtering discharges , 1986 .

[10]  Y. Matsuda,et al.  Development of a large area sputter-coating method using a new magnetron discharge , 1991 .

[11]  Chan,et al.  Electric field reversals in dc negative glow discharges. , 1989, Physical review. A, General physics.

[12]  M. Kushner,et al.  Cylindrical magnetron discharges. I. Current‐voltage characteristics for dc‐ and rf‐driven discharge sources , 1989 .

[13]  R. Latz,et al.  High Conducting Large Area Indium Tin Oxide Electrodes for Displays Prepared by DC Magnetron Sputtering , 1991 .

[14]  E. Kay,et al.  Efficient Low Pressure Sputtering in a Large Inverted Magnetron Suitable for Film Synthesis , 1965 .

[15]  Y. Matsuda,et al.  Development of large area sputter-coating method using magnetized a.c. plasmas with inclined electrodes , 1991 .

[16]  A. Wada,et al.  Space Charge Distribution in the Cathode Fall Region of an Ar Hollow Cathode Discharge , 1988 .