Fabrication technology of polysilicon resistors using novel mixed process for analogue CMOS applications
暂无分享,去创建一个
T. Roh | D. W. Lee | Hoon-Soo Park | JS Kim | J. Koo | Duckwhan Kim
[1] Krishna C. Saraswat,et al. Dopant segregation in polycrystalline silicon , 1980 .
[2] James D. Meindl,et al. Scaling limitations of monolithic polycrystalline-Silicon resistors in VLSI static RAM's and logic , 1982 .
[3] Edgard Laes,et al. Analog-digital technologies for mixed-signal processing: The driving force to success for the European industry , 1992, IEEE Micro.
[4] S. Uppili,et al. Process and device characterization for a 30-GHz f/sub T/ submicrometer double poly-Si bipolar technology using BF/sub 2/-implanted base with rapid thermal process , 1993 .