Validation of a correction procedure for removing the optical effects from transmission spectra of thin films on substrates

Transmission spectra of thin films on double side polished substrates feature a quasi sinusoidal baseline superimposed onto the true absorption spectra of the thin film. The quasi sinusoidal baseline is due to strong interference from multiple reflections within the film and can directly affect the relative degree of the measured absorption in the film. In a previous article [S. W. King and M. Milosevic, J. Appl. Phys. 111, 073109 (2012)], we described a method for the removal of these optical effects from infrared transmission spectra. This method renormalizes the spectrum and removes modulations imprinted onto the absorption by interference fringes. Here, we use simulated spectra for a model material to explicitly validate that the proposed correction procedure accurately extracts the pure absorption coefficient of the thin film and is not an ad hoc baseline correction procedure.

[1]  M. Milosevic,et al.  Internal Reflection and ATR Spectroscopy: Milosovic/Internal Reflection , 2012 .

[2]  S. King,et al.  A method to extract absorption coefficient of thin films from transmission spectra of the films on thick substrates , 2012 .

[3]  W. Lanford,et al.  Fourier transform infrared spectroscopy investigation of chemical bonding in low-k a-SiC:H thin films , 2011 .

[4]  S. Gates,et al.  Preparation and structure of porous dielectrics by plasma enhanced chemical vapor deposition , 2007 .

[5]  Joost J. Vlassak,et al.  Octamethylcyclotetrasiloxane-Based, Low-Permittivity Organosilicate Coatings Composition, Structure, and Polarizability , 2006 .

[6]  K. Hand,et al.  Fourier transform infrared spectroscopy for Mars science , 2005 .

[7]  Y. Hatanaka,et al.  Silicon Carbonitride Films by Remote Hydrogen-Nitrogen Plasma CVD from a Tetramethyldisilazane Source , 2004 .

[8]  Tracey Scherban,et al.  Compositional effects on electrical and mechanical properties in carbon-doped oxide dielectric films: Application of Fourier-transform infrared spectroscopy , 2004 .

[9]  William O. George,et al.  Whey fermentation: on-line analysis of lactose and lactic acid by FTIR spectroscopy , 1991, Applied Microbiology and Biotechnology.

[10]  Karen Maex,et al.  Low dielectric constant materials for microelectronics , 2003 .

[11]  A. Grill Plasma enhanced chemical vapor deposited SiCOH dielectrics: from low-k to extreme low-k interconnect materials , 2003 .

[12]  Sønnik Clausen,et al.  FTIR emission spectroscopy methods and procedures for real time quantitative gas analysis in industrial environments , 2002 .

[13]  K. Chittur,et al.  FTIR/ATR for protein adsorption to biomaterial surfaces. , 1998, Biomaterials.

[14]  J. Samitier,et al.  Analysis of geometrical effects on the behavior of transverse and longitudinal modes of amorphous silicon compounds , 1997 .

[15]  H. Ishida,et al.  Interpretation of reflection and transmission spectra for thin films: transmission. , 1995, Applied optics.

[16]  Maley Critical investigation of the infrared-transmission-data analysis of hydrogenated amorphous silicon alloys. , 1992, Physical review. B, Condensed matter.

[17]  M. Gunde Optical Effects in IR Spectroscopy: Thickness-Dependent Positions of Absorbance Lines in Spectra of Thin Films , 1992 .

[18]  M. Gunde,et al.  Thickness-Dependent Frequency Shift in Infrared Spectral Absorbance of Silicon Oxide Film on Silicon , 1990 .

[19]  A. Mahan,et al.  Correction for multiple reflections in infrared spectra of amorphous silicon , 1989 .

[20]  J. Abelson,et al.  Infrared absorption and thermal evolution study of hydrogen bonding in a-SiH , 1989 .

[21]  D. Allara,et al.  Infrared Spectroscopic Characterization of Silicon Nitride Films—Optical Dispersion Induced Frequency Shifts , 1986 .

[22]  B. Harbecke,et al.  Coherent and incoherent reflection and transmission of multilayer structures , 1986 .

[23]  W. Lanford,et al.  The hydrogen content of plasma‐deposited silicon nitride , 1978 .

[24]  Jerome J. Cuomo,et al.  Infrared and Raman spectra of the silicon-hydrogen bonds in amorphous silicon prepared by glow discharge and sputtering , 1977 .