Influence of pressure and silane depletion on microcrystalline silicon material quality and solar cell performance

Hydrogenated microcrystalline silicon growth by very high frequency plasma-enhanced chemical vapor deposition is investigated in an industrial-type parallel plate R&D KAI™ reactor to study the influence of pressure and silane depletion on material quality. Single junction solar cells with intrinsic layers prepared at high pressures and in high silane depletion conditions exhibit remarkable improvements, reaching 8.2% efficiency. Further analyses show that better cell performances are linked to a significant reduction of the bulk defect density in intrinsic layers. These results can be partly attributed to lower ion bombardment energies due to higher pressures and silane depletion conditions, improving the microcrystalline material quality. Layer amorphization with increasing power density is observed at low pressure and in low silane depletion conditions. A simple model for the average ion energy shows that ion energy estimates are consistent with the amorphization process observed experimentally. Finally...

[1]  Milan Vanecek,et al.  Fourier-transform photocurrent spectroscopy of microcrystalline silicon for solar cells , 2002 .

[2]  A. Matsuda,et al.  Origin of the Improved Performance of High-Deposition-Rate Microcrystalline Silicon Solar Cells by High-Pressure Glow Discharge , 2003 .

[3]  A. Matsuda,et al.  High rate growth of microcrystalline silicon at low temperatures , 2000 .

[4]  S. Goya,et al.  High-deposition-rate of microcrystalline silicon solar cell by using VHF PECVD , 2006 .

[5]  A. Howling,et al.  Plasma silane concentration as a determining factor for the transition from amorphous to microcrystalline silicon in SiH4/H2 discharges , 2007 .

[6]  A. Howling,et al.  Degree of dissociation measured by FTIR absorption spectroscopy applied to VHF silane plasmas , 1998 .

[7]  W. Schwarzenbach,et al.  Sheath impedance effects in very high frequency plasma experiments , 1996 .

[8]  P. Cabarrocas,et al.  Ion bombardment effects on microcrystalline silicon growth mechanisms and on the film properties , 2003 .

[9]  J. Perrin,et al.  The physics of plasma-enhanced chemical vapour deposition for large-area coating: industrial application to flat panel displays and solar cells , 2000 .

[10]  M. Kondo,et al.  Positive ion polymerization in hydrogen diluted silane plasmas , 2008 .

[11]  R. Brenot,et al.  Contribution of ions to the growth of amorphous, polymorphous, and microcrystalline silicon thin films , 2000 .

[12]  M. Vaněček,et al.  Influence of Pressure and Plasma Potential on High Growth Rate Microcrystalline Silicon Grown by Very High Frequency Plasma Enhanced Chemical Vapour Deposition , 2006 .

[13]  A. Howling,et al.  A gas flow uniformity study in large-area showerhead reactors for RF plasma deposition , 2000 .

[14]  A. Howling,et al.  Frequency effects in silane plasmas for plasma enhanced chemical vapor deposition , 1992 .

[15]  A. Lichtenberg,et al.  Principles of Plasma Discharges and Materials Processing: Lieberman/Plasma 2e , 2005 .

[16]  U. Fantz,et al.  Spectroscopic diagnostics and modelling of silane microwave plasmas , 1998 .

[17]  L. Feitknecht,et al.  Effect of the microstructure on the electronic transport in hydrogenated microcrystalline silicon , 2002 .

[18]  O. Leroy,et al.  Cross-Sections, Rate Constants and Transport Coefficients in Silane Plasma Chemistry , 1996 .

[19]  Arvind Shah,et al.  Complete microcrystalline p-i-n solar cell—Crystalline or amorphous cell behavior? , 1994 .

[20]  E. Amanatides,et al.  Combined effect of electrode gap and radio frequency on power deposition and film growth kinetics in SiH4/H2 discharges , 2002 .

[21]  A. Matsuda,et al.  Guiding Principles for Obtaining High-Quality Microcrystalline Silicon at High Growth Rates Using SiH4/H2 Glow-Discharge Plasma , 2007 .

[22]  M. Lieberman Spherical shell model of an asymmetric rf discharge , 1989 .

[23]  M. Kondo,et al.  Characterization of high-pressure capacitively coupled hydrogen plasmas , 2007 .

[24]  L. Feitknecht,et al.  Influence of Substrate on the Microstructure of Microcrystalline Silicon Layers and Cells , 2002 .

[25]  P. Cabarrocas,et al.  Effects of ion energy on the crystal size and hydrogen bonding in plasma-deposited nanocrystalline silicon thin films , 2005 .

[26]  U. Fantz Basics of plasma spectroscopy , 2006 .

[27]  Alan Howling,et al.  Fast equilibration of silane/hydrogen plasmas in large area RF capacitive reactors monitored by optical emission spectroscopy , 2007 .

[28]  L. Feitknecht,et al.  Microcrystalline silicon deposited at high rate on large areas from pure silane with efficient gas utilization , 2007 .

[29]  J. Coburn,et al.  Frequency dependence of ion bombardment of grounded surfaces in rf argon glow discharges in a planar system , 1985 .

[30]  Ahm Arno Smets,et al.  The role of ion-bulk interactions during high rate deposition of microcrystalline silicon by means of the multi-hole-cathode VHF plasma , 2006 .

[31]  Bernd Rech,et al.  Challenges in microcrystalline silicon based solar cell technology , 2006 .

[32]  M. Kondo Microcrystalline materials and cells deposited by RF glow discharge , 2003 .

[33]  A. Matsuda,et al.  Preparation of microcrystalline silicon films at ultra high-rate of 10 nm/s using high-density plasma , 2004 .

[34]  Michio Kondo,et al.  High-rate deposition of microcrystalline silicon p-i-n solar cells in the high pressure depletion regime , 2008 .

[35]  A. Lichtenberg,et al.  Principles of Plasma Discharges and Materials Processing , 1994 .

[36]  Arvind Shah,et al.  From amorphous to microcrystalline silicon films prepared by / hydrogen dilution using the VHF 70 MHz GD technique , 1998 .

[37]  Influence of the substrate's surface morphology and chemical nature on the nucleation and growth of microcrystalline silicon , 2005 .

[38]  Arvind Shah,et al.  Determination of Raman emission cross-section ratio in hydrogenated microcrystalline silicon , 2006 .