Effect of Gas Sources on the Deposition of Nano-Crystalline Diamond Films Prepared by Microwave Plasma Enhanced Chemical Vapor Deposition

Nano-crystalline diamond (NCD) films were deposited on silicon substrates by a microwave plasma enhanced chemical vapor deposition (MPCVD) reactor in C2H5OH/H2 and CH4/H2/O2 systems, respectively, with a constant ratio of carbon/hydrogen/oxygen. By means of atomic force microscopy (AFM) and X-ray diffraction (XRD), it was shown that the NCD films deposited in the C2H5OH/H2 system possesses more uniform surface than that deposited in the CH4/H2/O2 system. Results from micro-Raman spectroscopy revealed that the quality of the NCD films was different even though the plasmas in the two systems contain exactly the same proportion of elements. In order to explain this phenomenon, the bond energy of forming OH groups, energy distraction in plasma and the deposition process of NCD films were studied. The experimental results and discussion indicate that for a same ratio of carbon/hydrogen/oxygen, the C2H5OH/H2 plasma was beneficial to deposit high quality NCD films with smaller average grain size and lower surface roughness.

[1]  W. Jianhua,et al.  A Novel Method of Fabricating a Well-Faceted Large-Crystal Diamond Through MPCVD , 2009 .

[2]  M. Baldan,et al.  From micro to nanocrystalline transition in the diamond formation on porous pure titanium , 2008 .

[3]  F. Rossi,et al.  Surface modification of nanocrystalline diamond/amorphous carbon composite films , 2008 .

[4]  M. Chiorboli,et al.  Spectroscopic investigation of homoepitaxial CVD diamond for detection applications , 2008 .

[5]  J. Gracio,et al.  A new chemical path for fabrication of nanocrystalline diamond films , 2008 .

[6]  John A. Carlisle,et al.  Low temperature growth of ultrananocrystalline diamond , 2004 .

[7]  A. Fernandes,et al.  Study the effect of O2 addition on hydrogen incorporation in CVD diamond , 2004 .

[8]  Omar Elmazria,et al.  Surface acoustic wave devices based on nanocrystalline diamond and aluminium nitride , 2003 .

[9]  Z. Cao,et al.  Growth of nanocrystalline diamond protective coatings on quartz glass , 2002 .

[10]  Y. Vohra,et al.  Gas-phase thermodynamic models of nitrogen-induced nanocrystallinity in chemical vapor-deposited diamond , 2002 .

[11]  K. Walsh,et al.  Modeling the effect of oxygen on vapor phase diamond deposition inside micro-trenches , 2001 .

[12]  M. Umeno,et al.  Structural and optical properties of diamond and nano-diamond films grown by microwave plasma chemical vapor deposition , 2001 .

[13]  K. H. Chen,et al.  Growth of highly transparent nanocrystalline diamond films and a spectroscopic study of the growth , 2001 .

[14]  Kuei-Hsien Chen,et al.  Highly transparent nano-crystalline diamond films via substrate pretreatment and methane fraction optimization , 1998 .

[15]  J. Röpcke,et al.  Effect of oxygen on methyl radical concentrations in a CH4/H2 chemical vapor deposition reactor studied by infrared diode laser spectroscopy , 1996 .

[16]  Hemant D. Desai,et al.  Synthesis and characterization of fine grain diamond films , 1992 .

[17]  Wang,et al.  Detailed surface and gas-phase chemical kinetics of diamond deposition. , 1991, Physical review. B, Condensed matter.

[18]  S. Harris,et al.  Effects of oxygen on diamond growth , 1989 .

[19]  T. Ong,et al.  Low-temperature deposition of diamond films for optical coatings , 1989 .