Band offsets for ultrathin SiO2 and Si3N4 films on Si(111) and Si(100) from photoemission spectroscopy
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J. E. Rowe | Gerald Lucovsky | Theodore E. Madey | G. Lucovsky | T. Madey | J. Keister | J. Rowe | J. W. Keister | J. J. Kolodziej | Hiro Niimi | Hiroake Niimi | J. Kolodziej | H. Niimi
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