论文信息 - Comparison of HfCl4, HfI4, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO2 films deposited by ALD: A DFT study - 字舞流文

Comparison of HfCl4, HfI4, TEMA-Hf, and TDMA-Hf as precursors in early growing stages of HfO2 films deposited by ALD: A DFT study

C. Fierro | R. Ramírez-Bon | M. Cortez-Valadez | M. Flores-Acosta | C. Soubervielle-Montalvo | P. Mani-Gonzalez | J. R. Farias-Mancilla | A. Vargas-Ortiz | Jose L. Enriquez-Carrejo