论文信息 - Three dimensional topography simulation model using diffusion equation

Three dimensional topography simulation model using diffusion equation

An etching model for three-dimensional topography simulation is proposed in which the topography is deduced by solving the diffusion equation. A 3-D topography simulator called 3-D MULSS (multilayer shape simulator) has been developed on the basis of this model. Using this program, contact hole and trench etching was simulated exactly, and the computation was extremely fast.<<ETX>>

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