论文信息 - Further optimization of plasma nitridation of ultra-thin oxides for 65nm node MOSFETs - 字舞流文

Further optimization of plasma nitridation of ultra-thin oxides for 65nm node MOSFETs

A. Veloso | F. Nouri | K. Ahmed | R. Schreutelkamp | M. Schaekers | S. Mertens | J. Campbell | P. Kraus | A. Rothschild | L. Date | F. Cubaynes | T. C. Chua | T. M. Bauer | J. Cruse