(Invited) Electrical Characterization of Ge-pFETs with HfO2/TiN Metal Gate: Review of Possible Defects Impacting the Hole Mobility
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Jerome Mitard | Marc Heyns | Marc Meuris | Matty Caymax | Brice De Jaeger | Benjamin Vincent | Geert Eneman | Kristin DeMeyer | Raymond Krom | R. Loo | Thomas Hoffmann | W. Vandervorst