Sputtering of multicomponent materials

A survey is given of present, still rather sketchy, knowledge of (a) preferential sputtering of certain species in multielement materials, (b) the subsequent formation of a near surface layer with altered composition, (c) the total sputtering yields as a function of composition after steady‐state conditions are established, and (d) the angular ejection distribution of different species. The basic differences between single phase alloys or compounds and multiphase alloys and materials with volatile species are described.

[1]  A. Gntherschulze,et al.  Die Elektronenablsung durch den Aufprall der positiven Ionen auf die Kathode einer Glimmentladung: II. Der Einflu der Oberflchenbeschaffenheit der Kathode , 1938 .

[2]  W. Tollmien,et al.  „Neue Untersuchungen über die Kathodenzerstäubung der Glimmentladung.“ , 1942 .

[3]  R. Hanau.  Cathode Sputtering in the Abnormal Glow Discharge , 1949 .

[4]  C. E. Weber,et al.  Cathodic Sputtering for Micro‐Diffusion Studies , 1952 .

[5]  G. Wehner.  Low-Energy Sputtering Yields in Hg , 1958 .

[6]  E. Gillam.  The penetration of positive ions of low energy into alloys and composition changes produced in them by sputtering , 1959 .

[7]  D. Haneman.  Structure and adsorption characteristics of (111) and (111) surfaces of InSb cleaned by ion bombardment and annealing , 1960 .

[8]  O. C. Yonts,et al.  HIGH-ENERGY SPUTTERING , 1960 .

[9]  G. K. Wehner,et al.  Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 ev , 1961 .

[10]  R. Hines,et al.  Sputtering of Vitreous Silica by 20‐ to 60‐kev Xe+ Ions , 1961 .

[11]  O. Almén,et al.  SPUTTERING EXPERIMENTS IN THE HIGH ENERGY REGION , 1961 .

[12]  R. S. Nelson,et al.  Evidence for heated spikes in bombarded gold from the energy spectrum of atoms ejected by 43 kev a+and xe+ions , 1962 .

[13]  G. K. Wehner,et al.  Sputtering Yields for Low Energy He+‐, Kr+‐, and Xe+‐Ion Bombardment , 1962 .

[14]  H. Schirrwitz.  Kathodenzerstäubung bei Beschuß verschiedener Metalle mit Argon-Ionen im mittleren Energiebereich† , 1962 .

[15]  M. Robinson,et al.  Sputtering Experiments with 1‐ to 5‐keV Ar+ Ions , 1963 .

[16]  G. Wehner,et al.  MODIFICATION OF THE LUNAR SURFACE BY THE SOLAR-WIND BOMBARDMENT , 1963 .

[17]  E. J. Zdanuk,et al.  The sputtering of compounds , 1964 .

[18]  B. Navinšek.  Sputtering Yields of Alkali Halide Single Crystals Bombarded by 2‐ to 10‐keV Ions , 1965 .

[19]  R. S. Nelson.  An investigation of thermal spikes by studying the high energy sputtering of metals at elevated temperatures , 1965 .

[20]  G. Wehner,et al.  Sputtering studies of insulators by means of Langmuir probes , 1965 .

[21]  H. Birnbaum,et al.  Electron Microscope Study of the Effect of Oxygen Ion Irradiation on Lithium Fluoride , 1965 .

[22]  H. Matzke,et al.  ION-BOMBARDMENT-INDUCED RADIATION DAMAGE IN SOME CERAMICS AND IONIC CRYSTALS: DETERMINED BY ELECTRON DIFFRACTION AND GAS RELEASE MEASUREMENTS , 1966 .

[23]  H. Matzke.  Radiation damage and xenon release in quartz and fused silica following ion bombardment , 1966 .

[24]  P. D. Davidse,et al.  Equivalent dc Sputtering Yields of Insulators , 1967 .

[25]  W. Patterson,et al.  The Sputtering of Nickel–Chromium Alloys , 1967 .

[26]  R. Kelly.  Sputtering and depth-distribution phenomena in KCl, Al2O3, and TiO2 , 1968 .

[27]  S. Batsanov.  The Concept of Electronegativity. Conclusions and Prospects , 1968 .

[28]  H. Matzke.  INERT GAS DIFFUSION AND RADIATION DAMAGE IN IONIC CRYSTALS AND SINTERS FOLLOWING ION BOMBARDMENT. , 1968 .

[29]  P. Sigmund.  Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets , 1969 .

[30]  N. Olson,et al.  Simultaneous Measurement of Sputtered Constituents of Cu3Au , 1969 .

[31]  G. S. Anderson.  Temperature Dependence of the Ag/Cu Sputtering Ratio for the Eutectic , 1969 .

[32]  H. Bach.  DETERMINATION OF BOND ENERGY OF SILICA GLASS BY MEANS OF ION SPUTTERING INVESTIGATIONS. , 1970 .

[33]  H. Matzke,et al.  On ion implantation in silicon carbide , 1970 .

[34]  L. Q. Nghi,et al.  Phénomènes de pulvérisation et de distribution en profondeur. Partie IV. Pulvérisation cathodique des oxydes Nb2O5, Ta2O5 et WO3 , 1970 .

[35]  R. Kelly,et al.  The crystallization of amorphous ZrO2 by thermal heating and by ion bombardment , 1970 .

[36]  S. Dahlgren,et al.  Reduced Nickel Concentration in a Stainless‐Steel Deposit from Bias Sputtering , 1970 .

[37]  G. Wehner,et al.  Alloy Sputtering Studies with in situ Auger Electron Spectroscopy , 1971 .

[38]  H. Dunlap,et al.  DISORDER PRODUCED IN SiC BY ION BOMBARDMENT. , 1971 .

[39]  G. Wehner,et al.  Cone Formation on Metal Targets during Sputtering , 1971 .

[40]  T. Yamashina,et al.  Auger spectroscopy study on copper-nickel alloy surfaces related to the catalysis , 1971 .

[41]  D. T. Quinto,et al.  Auger spectra of copper-nickel alloys , 1971 .

[42]  E. D. Mcclanahan,et al.  Reduced Sputtering Yields for Two-Phase Ag-Ni and Ag-Co Targets , 1972 .

[43]  R. Kelly,et al.  On the increase in the electrical conductivity of MoO3 and V2O5 following ion bombardment. Studies on bombardment-enhanced conductivity-I , 1972 .

[44]  M. Ono,et al.  Auger Spectroscopy Study on the Surface Composition of Copper–Nickel Alloys after Annealing and Sputtering , 1972 .

[45]  H. H. Andersen,et al.  The Z1 dependence of heavy-ion sputtering yield in copper , 1972 .

[46]  J. Tansey,et al.  ELECTRICAL AND STRUCTURE SENSITIVE MEASUREMENTS ON ION IMPLANTED GaAs. , 1972 .

[47]  C. B. Cooper,et al.  Mass Spectrometric Study of Sputtering of KB by Low‐Energy Ar+ and Xe+ Ions , 1972 .

[48]  Takashi Oohashi,et al.  Protrusion Formation on Metal Targets during Co-Sputtering , 1972 .

[49]  G. Wehner,et al.  AUGER ELECTRON SPECTROSCOPY STUDIES OF SPUTTER DEPOSITION AND SPUTTER REMOVAL OF Mo FROM VARIOUS METAL SURFACES. , 1972 .

[50]  I. Adler,et al.  X-Ray Photoelectron Spectroscopic Studies of Valence States Produced by Ion-Sputtering Reduction , 1972 .

[51]  G. Sletten,et al.  Preparation of isotope targets by heavy ion sputtering , 1972 .

[52]  D. P. Jackson.  Binding energies in cubic metal surfaces , 1973 .

[53]  G. Slodzian,et al.  Effect of oxygen on the sputtering of aluminium targets bombarded with argon ions , 1973 .

[54]  W. Grant,et al.  On the damage induced in GaP single crystals by Te ion bombardment , 1973 .

[55]  R. Shimizu,et al.  Secondary and auger electron spectra of a Cu-Be alloy , 1973 .

[56]  A. Holscher,et al.  Auger spectroscopic study of the surface composition of Pt/Sn alloys in ultrahigh vacuum and in the presence of oxygen and hydrogen , 1973 .

[57]  H. Bay,et al.  Sputtering-yield studies on silicon and silver targets , 1973 .

[58]  I. Wilson.  The topography of sputtered semiconductors , 1973 .

[59]  R. P. Edwin.  Measurements of the sputter rate of fused silica bombarded by argon ions of energy 12-32 keV , 1973 .

[60]  M. Ono,et al.  Quantitative auger analysis of copper-nickel alloy surfaces after argon ion bombardment , 1973 .

[61]  R. Kelly,et al.  The sputtering of oxides part i: a survey of the experimental results , 1973 .

[62]  G. Somorjai,et al.  Auger electron spectroscopy study of the surface composition of the lead‐indium system , 1973 .

[63]  V. M. Gusev,et al.  On silicon amorphization during different mass ion implantation , 1973 .

[64]  H. Oechsner.  Untersuchungen zur Festkörperzerstäubung bei schiefwinkligem Ionenbeschuß polykristalliner Metalloberflächen im Energiebereich um 1 keV , 1973 .

[65]  N. Winograd,et al.  X-ray photoelectron spectroscopic studies of nickel-oxygen surfaces using oxygen and argon ion-bombardment , 1974 .

[66]  H. F. Winters,et al.  Sputtering of chemisorbed gas (nitrogen on tungsten) by low‐energy ions , 1974 .

[67]  J. Cuomo,et al.  Amorphous magnetic materials for bubble domain and magneto-optics application , 1974 .

[68]  N. Winograd,et al.  ESCA studies of metal-oxygen surfaces using argon and oxygen ion-bombardment , 1974 .

[69]  John C. C. Fan,et al.  Differential sputtering of MgO/Au cermet films and its application to high-yield secondary-electron emitters , 1974 .

[70]  H. Schröder,et al.  Sputtering yields and Specific energy losses of Ar+ Ions with energies from 5 TO 30 KeV AT SiO2 , 1974 .

[71]  Y. Ohashi,et al.  Surface of Iron Bombarded with Argon and Oxygen Ions , 1974 .

[72]  J. M. Chen,et al.  Effects of low-energy argon-ion bombardment on MoS2 , 1974 .

[73]  G. Wehner.  Sputtering in Thin Film Analysis Methods , 1974 .

[74]  R. Kelly,et al.  Ion-impact chemistry in the system titanium-oxygen (studies on bombardment-enhanced conductivity—III) , 1974 .

[75]  W. F. V. D. Weg,et al.  Change of surface composition of SiO2 layers during sputtering , 1974 .

[76]  F. Williams,et al.  Binary alloy surface compositions from bulk alloy thermodynamic data , 1974 .

[77]  K. Bruce Winterbon,et al.  Ion Implantation Range and Energy Deposition Distributions , 1975 .

[78]  M. Ono,et al.  Reply to comments on “quantitative Auger analysis of copper-nickel alloy surfaces after argon ion bombardment”☆ , 1975 .

[79]  R. Kelly,et al.  The effect of ion-bombardment on the structure of bi2O3, moo3, teo2, and v2o5 , 1975 .

[80]  C. R. Helms,et al.  Determination of the surface composition of the Cu−Ni alloys for clean and adsorbate−covered surfaces , 1975 .

[81]  Yamashina Toshiro,et al.  Observation of surface composition of copper-nickel alloy by auger spectra in the lower energy region (at around 100 eV) , 1975 .

[82]  G. Wehner.  THE ASPECTS OF SPUTTERING IN SURFACE ANALYSIS METHODS , 1975 .

[83]  J. Poate,et al.  The sputtering of PtSi and NiSi , 1975 .

[84]  R. Kelly,et al.  Studies on bombardment-enhanced conductivity. IV: IV. On the chemical state of oxygen-bombarded Nb2O5 , 1975 .

[85]  M. Ono,et al.  Effect of target temperature on surface composition changes of Cu−Ni alloys during Ar ion bombardment , 1975 .

[86]  D. Landolt,et al.  Quantitative auger electron spectroscopy analysis of AgPd and NiPd alloys , 1975 .

[87]  Roger Kelly,et al.  Criteria for bombardment-induced structural changes in non-metallic solids , 1975 .

[88]  W. O. Hofer,et al.  Depth-profiling of Cu-Ni sandwich samples by secondary ion mass spectrometry , 1975 .

[89]  A. Benninghoven,et al.  Developments in secondary ion mass spectroscopy and applications to surface studies , 1975 .

[90]  P. Stonehart,et al.  Surface characterization of catalytically active tungsten carbide (WC) , 1975 .

[91]  H. Brongersma,et al.  Selected topics in low-energy ion scattering: Surface segregation in Cu/Ni alloys and ion neutralization , 1975 .

[92]  A. Oostrom.  Application of AES to the study of selective sputtering of thin films , 1976 .

[93]  L. A. West.  Relative sputtering yields and quantitative surface analysis by Auger spectroscopy , 1976 .

[94]  H. Pickering.  Ion sputtering of alloys , 1976 .

[95]  R. S. Berg,et al.  Surface texturing by sputter etching , 1976 .

[96]  G. Nelson.  Search for preferential sputtering in Ag/Au alloys , 1976 .

[97]  L. N. Nevzorova,et al.  Peculiarities of particle ejection in scattering and sputtering of single crystals , 1976 .

[98]  T. Yamashina,et al.  A quantitative analysis of surface segregation and in-depth profile of copper-nickel alloys , 1976 .

[99]  L. Davis,et al.  Quantitative Auger Electron Spectroscopy with Elemental Sensitivity Factors , 1976 .

[100]  N. Warmoltz,et al.  The influence of selective sputtering on surface composition , 1976 .

[101]  J. K. Howard,et al.  Auger study of preferred sputtering on Ag–Au alloy surfaces , 1976 .

[102]  R. P. Frankenthal,et al.  Analysis of the Air‐Formed Oxide Film on a Series of Iron‐Chromium Alloys by Ion‐Scattering Spectrometry , 1976 .

[103]  C. B. Cooper,et al.  AES depth profiling with N2+ ion sputtering , 1976 .

[104]  D. W. Rice,et al.  Interpretation of the x-ray photoemission spectra of cobalt oxides and cobalt oxide surfaces , 1976 .

[105]  C. Pillinger,et al.  Preferential sputtering as a method of producing metallic iron, inducing major element fractionation and trace element enrichment , 1976 .

[106]  J. Coburn.  Sputtering in the surface analysis of solids: A discussion of some problems , 1976 .

[107]  K. Jacobi,et al.  Oxidation and annealing of GaP and GaAs (111)-faces studied by AES and UPS , 1976 .

[108]  J. K. Howard,et al.  Auger study of preferred sputtering on binary alloy surfaces , 1976 .

[109]  R. Kelly,et al.  On the role of recoil implantation in altering the stoichiometry of a bombarded solid , 1976 .

[110]  S. Komiya,et al.  Composition of binary alloys by simultaneous SIMS and AES measurements , 1976 .

[111]  G. Betz,et al.  Sputtering of the alloy systems AgAu, AuCu, and AgCu studied by Auger electron spectroscopy , 1976 .

[112]  H. F. Winters,et al.  Influence of the altered layer on depth profiling measurements , 1976 .

[113]  Simon Thomas.  AES-ion sputtering analysis and the surface composition of TiO2 , 1976 .

[114]  N. Winograd,et al.  X-ray photoelectron spectroscopic studies of PbO surfaces bombarded with He+, Ne+, Ar+, Xe+ and Kr+ , 1976 .

[115]  J. Biersack,et al.  Sputtering of potassium chloride by H, He, and Ar ions , 1976 .

[116]  D. Gruen,et al.  Aluminum oxide sputtering: a new approach to understanding the sputtering process for binary targets. [15- and 40 kV Ar/sup +/, 15-kV H/sup +/] , 1976 .

[117]  J. Vossen.  Inhibition of chemical sputtering of organics and C by trace amounts of Cu surface contamination , 1976 .

[118]  J. K. Howard,et al.  Surface enrichment of copper due to keV Xe sputtering of an Al-Cu mixture , 1976 .

[119]  R. Kelly,et al.  Recoil implantation from a thin source: I. Underlying theory and numerical results , 1976 .

[120]  Tennyson Smith.  Auger electron spectroscopy and ion sputter profiles of oxides on aluminum , 1976 .

[121]  R. Kelly,et al.  Preferential oxygen sputtering from Nb2O5 , 1976 .

[122]  Gabor A. Somorjai,et al.  The surface composition of Au–Sn alloys determined by Auger electron spectroscopy , 1977 .

[123]  P. Holloway,et al.  Quantitative auger electron analysis of homogeneous binary alloys: Chromium in gold , 1977 .

[124]  D. Landolt,et al.  Beam effects in Auger electron spectroscopy analysis of titanium oxide films , 1977 .

[125]  G. Somorjai,et al.  The surface composition of the gold-palladium binary alloy system , 1977 .

[126]  R. Shimizu,et al.  Study of preferential sputtering on binary alloy by in-situ Auger measurement of sputtered and sputter-deposited surfaces , 1977 .

[127]  K. Wandelt,et al.  Core and valence level photoemission studies of iron oxide surfaces and the oxidation of iron , 1977 .

[128]  Y. Taga,et al.  Changes in the Surface Structure of ε-Cu 3 Sn and η-Cu 6 Sn 5 due to Sputtering , 1977 .

[129]  R. Kelly.  Theory of thermal sputtering , 1977 .

[130]  T. Yamashina,et al.  In-depth profile of altered layers of copper-nickel alloys formed by sputtering , 1977 .

[131]  R. Holm,et al.  ESCA studies on changes in surface composition under ion bombardment , 1977 .

[132]  E. Benes,et al.  Measurements of the velocity spectrum of sputtered Na from a NaI target by a Doppler‐shift laser spectrometer , 1977 .

[133]  D. Dove,et al.  Effect of ion bombardment on the surface composition of Cu‐Ga alloys studied by differential reflectometry and AES , 1977 .

[134]  Simon Thomas,et al.  An Attempt at the AES Evaluation of the Composition of Off‐Stoichiometric Silicon Nitride , 1977 .

[135]  F. Viehböck,et al.  1.5 Effects in Auger electron spectroscopy due to the probing electrons and sputtering , 1977 .

[136]  W. R. Hudson.  Ion beam texturing , 1977 .

[137]  N. McIntyre,et al.  Quantitative analysis of thin oxide films using x‐ray photoelectron spectroscopy and rastered ion bombardment , 1977 .

[138]  S. Murarka,et al.  Anodic Oxide on GaAs : Quantitative Chemical Depth Profiles Obtained Using Auger Spectroscopy and Neutron Activation Analysis , 1977 .

[139]  J. R. Arthur,et al.  Quantitative analysis of AlxGa1−xAs by Auger electron spectroscopy , 1977 .

[140]  M. Arita,et al.  Surface Dehomogenization of Binary Alloys during Evaporation and Ion Sputtering , 1977 .

[141]  P. Haff.  A model for surface layer composition changes in sputtered alloys and compounds , 1977 .

[142]  G. Betz,et al.  Studies of surface composition of Ag‐Au, Au‐Cu, and Ag‐Cu alloys after ion bombardment by Auger electron spectroscopy , 1977 .

[143]  N. McIntyre,et al.  X-ray photoelectron spectroscopic studies of iron oxides , 1977 .

[144]  J. Poate,et al.  Surface‐layer composition changes in sputtered alloys and compounds , 1977 .

[145]  G. Wehner,et al.  Composition variations as a function of ejection angle in sputtering of alloys , 1977 .

[146]  G. Wehner.  Isotope enrichment in sputter deposits , 1977 .

[147]  T. T. Sheng,et al.  Argon bubble formation in the sputtering of PtSi , 1978 .

[148]  T. Yamashina,et al.  Measurement of erosion yields for a SiC surface on H+, D+ and Ar+ bombardment , 1978 .

[149]  A. E. Vries,et al.  The sputtering processes during 6 kev Xe ion beam bombardment of halides , 1978 .

[150]  E. Taglauer,et al.  Mass and Energy Dependence of the Equilibrium Surface Composition of Sputtered Tantalum Oxide , 1978 .

[151]  C. N. Reilley,et al.  Effect of argon ion bombardment on metal complexes and oxides studied by x-ray photoelectron spectroscopy , 1978 .

[152]  F. Garbassi,et al.  Surface composition and oxygen chemisorption on Ag-Pd alloys , 1978 .

[153]  G. Mcguire.  Effects of ion sputtering on semiconductor surfaces , 1978 .

[154]  M. Shehata,et al.  On the problem of whether excited states amongst sputtered particles are of thermal origin , 1978 .

[155]  P. Martin,et al.  On the influence of reactive gases on sputtering and secondary ion emission , 1978 .

[156]  J. Poate,et al.  Sputtering of PtSi , 1978 .

[157]  R. Collins.  Preferential sputtering of binary alloys with diffusion: The equilibrium distribution , 1978 .

[158]  J. Greene,et al.  Sputtering of metal alloys containing second‐phase precipitates , 1978 .

[159]  R. Shimizu,et al.  Thickness and in-depth composition profile of altered layer caused on CuNi alloy surface due to preferential sputtering , 1978 .

[160]  H. Oechsner,et al.  Sputtering of Ta2O5 by Ar+ ions at energies below 1 keV , 1978 .

[161]  J. Bohdansky,et al.  Sputtering yields of graphite and carbides and their potential use as first wall materials , 1978 .

[162]  R. Shimizu,et al.  Quantitative AES analysis of coevaporated Cu/Ni films and the effects of ion sputtering on them: experiments at liquid nitrogen and room temperature , 1978 .

[163]  I. L. Singer,et al.  Abstract: Composition changes in GaAs due to low‐energy ion bombardment , 1978 .

[164]  R. Shimizu,et al.  Auger Study of Preferential Sputtering for Cu–Ni Alloy Sample , 1978 .

[165]  V. Ponec,et al.  The surface composition of platinum-palladium alloys determined by auger electron spectroscopy , 1978 .

[166]  R. Kelly.  An attempt to understand preferential sputtering , 1978 .

[167]  J. Whitton,et al.  Change in stoichiometry of thin films of palladium chloride during ion beam analysis , 1978 .

[168]  G. Nelson.  Combined low‐energy ion scattering and x‐ray photoelectron spectroscopy study of Ta2O5 bombarded by 500–3000‐eV He ions , 1978 .

[169]  P. Ho.  Effects of enhanced diffusion on preferred sputtering of homogeneous alloy surfaces , 1978 .

[170]  A. E. Vries,et al.  Sputtering of an AgAu alloy by bombardment with 6 keV Xe+ ions , 1978 .

[171]  K. Wandelt,et al.  An X-ray photoelectron spectroscopy study of the chemical changes in oxide and hydroxide surfaces induced by Ar+ ion bombardment , 1978 .

[172]  M. H. Lee,et al.  Alloy compositional profiles by AES, ESCA, and ion sputtering: Air‐exposed Fe1−xPdx films , 1978 .

[173]  T. Yamashina,et al.  An AES study of surface segregation of AgAu alloys with ion bombardment and annealing , 1978 .

[174]  J. V. Biggers,et al.  Surface analysis of WC–Co composite materials (2) Quantitative Auger electron spectrometry , 1978 .

[175]  R. Kelly,et al.  Recoil implantation from a thin source: II. Extension to the problems of recoil sputtering and of moderately thick sources , 1978 .

[176]  T. Yamashina,et al.  Sputtering process of a silicon carbide surface with energetic ions by means of an AES-SIMS-FDS combined system , 1978 .

[177]  G. Carter,et al.  The influence of preferential enhanced diffusion on composition changes in sputtered binary solids , 1978 .

[178]  A. E. Vries,et al.  The sputtering processes of alkali halides during 6 keV Xe+ ion bombardment , 1978 .

[179]  Z. Liau,et al.  Limits of composition achievable by ion implantation , 1978 .

[180]  H. Brongersma,et al.  Surface segregation in Cu-Ni and Cu-Pt alloys; A comparison of low-energy ion-scattering results with theory , 1978 .

[181]  R. Shimizu,et al.  Preferential sputtering of coevaporated Cu-Ni film associated with altered layer , 1978 .

[182]  G. Wehner,et al.  Abstract: Sputter yields of bimetal mixtures , 1979 .

[183]  P. Tortorelli,et al.  Sputtering of two‐phase polycrystalline metals , 1979 .

[184]  A. Benninghoven,et al.  Combined SIMS, AES, and XPS investigations of tantalum oxide layers , 1979 .

[185]  J. Roth,et al.  Sputtering of Be and BeO by light ions , 1979 .

[186]  B. Sartwell.  Thin‐film sputtering yields for Fe, Cr, and an Fe‐Cr alloy measured by proton‐induced x rays , 1979 .

[187]  G. Wehner,et al.  Mass effects on angular distribution of sputtered atoms , 1979 .

[188]  P. Sigmund.  Recoil implantation and ion‐beam‐induced composition changes in alloys and compounds , 1979 .

[189]  K. Wandelt,et al.  Abstract: An XPS study of the chemical changes in oxide and hydroxide surfaces induced by Ar+ ion bombardment , 1979 .

[190]  N. Winograd,et al.  Surface segregation of PdAg alloys induced by ion bombardment , 1979 .

[191]  G. Maderlechner,et al.  The sputtering mechanism for low-energy light ions , 1979 .

[192]  G. Carter,et al.  The influence of incident flux dependent radiation enhanced diffusion on composition changes of sputtered binary solids , 1979 .

[193]  G. Leaf,et al.  Effects of radiation-induced segregation and preferential sputtering on the sputtering rate of alloys , 1979 .

[194]  R. Shimizu,et al.  Preferential sputtering of Cu-Ni alloys at low temperature using lower energy auger electron spectra∗☆ , 1979 .

[195]  D. Landolt,et al.  Influence of sputtering on the surface composition of Fe-Cr-Mo alloys , 1979 .

[196]  P. Ho,et al.  Preferred sputtering on binary alloy surfaces of the AlPdSi system , 1979 .

[197]  K. Wittmaack,et al.  Energy and fluence dependence of the sputtering yield of silicon bombarded with argon and xenon , 1979 .

[198]  J. Coburn.  The influence of ion sputtering on the elemental analysis of solid surfaces , 1979 .

[199]  N. McIntyre,et al.  Preferential sputtering in oxides as metals and revealed by x‐ray photoelectron spectroscopy , 1979 .

[200]  W. Husinsky,et al.  Energy spectra of sputtered Na atoms from bombardment of NaCl with 20 keV rare gas ions , 1979 .

[201]  Wen-yaung Lee.  Sputter etching studies of Fe–Ni and Fe–Pd films , 1979 .

[202]  R. S. Robinson,et al.  Ion beam texturing of surfaces , 1979 .

[203]  A. Frennet,et al.  Calculation of the surface composition of binary alloys by the regular solution theory; analysis of parameters involved and surface relaxation effects , 1979 .

[204]  P. Ho,et al.  Abstract: Preferred sputtering on binary alloy surfaces of the Al–Pd–Si system , 1979 .

[205]  J. Poate,et al.  Structural and compositional changes in ion-bombarded Ta2O5 , 1979 .

[206]  R. Kelly.  Thermal effects in sputtering , 1979 .

[207]  H. H. Andersen.  Abstract: Sputtering of multicomponent metal and semiconductor targets , 1979 .

[208]  P. Holloway,et al.  Preferential sputtering of Ta2O5 by argon ions , 1979 .

[209]  H. Tompkins.  Preferential sputtering in gold–nickel and gold–copper alloys , 1979 .

[210]  T. Tsang,et al.  XPS studies of ion bombardment damage of iron—sulfur compounds , 1979 .

[211]  R. P. Frankenthal,et al.  An AES study of the surface composition of ion-etched iron chromium alloys: effect of adsorbed CO , 1979 .

[212]  P. Sigmund.  Sputtering of single and multiple component materials , 1980 .

[213]  V. Chernysh,et al.  Selective sputtering of single crystals of binary semiconductor compounds , 1980 .

[214]  J. Haber,et al.  XPS study of α-quartz surface , 1980 .

[215]  T. Tsang,et al.  XPS studies of ion-bombardment damage of transition metal sulfides , 1980 .

[216]  G. Betz,et al.  Sputtering of the ternary alloy system AgAuCu with 2 keV Ar ions , 1980 .

[217]  J. Borders.  Precipitation Processes in Implanted Materials , 1980 .

[218]  G. Leaf,et al.  Sputter-induced surface composition changes in alloys , 1980 .

[219]  J. Roth,et al.  Low Energy Light Ion Sputtering of Metals and Carbides , 1980 .

[220]  K. Wittmaack,et al.  Projectile-energy dependence of compositional changes produced in sputtering of a dilute Si(Fe, W) alloy , 1980 .

[221]  Y. Ishida,et al.  Depletion of Copper from the Grain Boundary Region of Copper-Nickel Alloys during Sputtering at Elevated Temperatures , 1980 .

[222]  R. Kelly.  On the problem of whether mass or chemical bonding is more important to bombardment-induced compositional changes in alloys and oxides , 1980 .

[223]  G. Betz,et al.  Changes in the surface composition of AgPd, AuPd and CuPd alloys under ion bombardment , 1980 .

[224]  Y. Ishida,et al.  Dose Rate Effect of the Preferential Sputtering of Copper-Nickel Alloys by Argon Ion at Elevated Temperatures , 1980 .

[225]  S. T. Picraux.  Equilibrium Phase Formation by Ion Implantation , 1980 .

[226]  M. Szymoński.  Sputtering of Cu and Zn atoms from elemental and alloy targets , 1980 .

[227]  P. Sigmund,et al.  Distortion of depth profiles during sputtering: I. General description of collisional mixing , 1980 .

[228]  M. Opitz,et al.  Oberflächenanreicherung Beim Zerstäuben mit Verschiedenen Ionenenergien , 1980 .

[229]  R. Shimizu,et al.  Investigation on surface compositions of CuNi alloy under Ar + ion bombardment by ISS and in situ AES measurements , 1980 .

[230]  A. Katrib.  The reduction of Pt(IV) to Pt(II) by X-ray and argon-ion bombardment; evidence from X-ray photoelectron spectroscopy , 1980 .

[231]  U. Littmark,et al.  Recoil mixing in solids by energetic ion beams , 1980 .

[232]  P. Holloway,et al.  Preferential sputtering of Si3N4 , 1981 .

[233]  R. P. Frankenthal,et al.  Effect of ion sputtering on the surface composition of indium-lead and indium-tin alloys , 1981 .

[234]  H. H. Andersen,et al.  The angular distribution of material sputtered from AgAu and CuPt by 20–80 keV argon , 1981 .

[235]  M. Sundararaman,et al.  Sputtering induced surface composition changes in copper-palladium alloys , 1981 .

[236]  H. Wiedersich,et al.  Ion bombardment-induced subsurface composition modifications in alloys at elevated temperatures , 1981 .

[237]  A. E. Vries,et al.  Beam induced decomposition and sputtering of LiI , 1981 .

[238]  P. Sigmund,et al.  Depth of origin of sputtered atoms , 1981 .

[239]  R. P. Frankenthal,et al.  Effect of ion sputtering on the surface composition of tin-lead alloys , 1981 .

[240]  M. Kelley,et al.  Differential sputtering and surface segregation: The role of enhanced diffusion , 1981 .

[241]  J. Dudonis,et al.  Surface enrichment in AgAuPd alloys under ion bombardment , 1981 .

[242]  G. Betz,et al.  Dynamic surface composition changes in binary alloys under ion bombardment , 1981 .

[243]  P. Karulkar.  Effects of sputtering on the surface composition of niobium oxides , 1981 .

[244]  M. Roush,et al.  Simulation of dynamic changes in near-surface composition during ion bombardment , 1981 .

[245]  R. S. Robinson,et al.  The time development of impurity-generated sputter cones on copper , 1981 .

[246]  F. Toyokawa,et al.  A static-sims study on preferential sputtering on copper-nickel alloy surface , 1981 .

[247]  T. Tsang,et al.  XPS studies of surface damages of transition metal fluorosilicates under argon ion bombardment , 1981 .

[248]  G. L. Chen,et al.  Light Ion Sputtering of Fusion Reactor Materials in Dependence of Angle of Incidence , 1981 .

[249]  R. Behrisch,et al.  Sputtering by Particle Bombardment III , 1981 .

[250]  J. Greene,et al.  Enhanced diffusion and precipitation in Cu: In alloys due to low energy ion bombardment , 1981 .

[251]  T. Wirth,et al.  Composition Changes of NiSi and PtSi Due to Ar+ Ion Bombardment Determined from AES Measurements , 1982, July 16.

[252]  P. Sigmund,et al.  Sputtering of multicomponent materials: Elements of a theory , 1982 .

[253]  R. S. Robinson,et al.  Ion‐beam‐induced topography and surface diffusion , 1982 .

[254]  B. Ralph,et al.  A study of the sputtering of copper–nickel using a combination of techniques , 1982 .

[255]  R. P. Frankenthal,et al.  Summary Abstract: Effect of ion sputtering on the surface composition of binary alloys of tin, lead, and indium , 1982 .

[256]  B. Garrison.  Preferential sputtering of binary compounds: A model study , 1982 .

[257]  H. F. Winters.  Mass effect in the physical sputtering of multicomponent materials , 1982 .

[258]  H. H. Andersen,et al.  Measurements of angular distributions of sputtered material as a new tool for surface-segregation studies: Segregation in CuPt alloys , 1982 .

[259]  M. Roush,et al.  Dynamic simulation of changes in near-surface composition during ion bombardment , 1982 .

[260]  R. Howard,et al.  Textured germanium optical storage medium , 1982 .

[261]  P. Holloway,et al.  Preferential sputtering of PtSi, NiSi2, and AgAu , 1982 .

[262]  E. Taglauer,et al.  Preferential sputtering of compounds due to light ion bombardment , 1982 .

[263]  R. S. Robinson,et al.  Summary Abstract: Optical properties of ion beam microtextured surfaces , 1982 .

[264]  J. Greene,et al.  Low energy ion bombardment enhanced diffusion, segregation, and phase transformations in Cu:In alloys , 1982 .

[265]  R. Bastasz,et al.  Threshold sputtering effects in a Cu–Au alloy , 1982 .

[266]  J. H. Thomas,et al.  An XPS study of the influence of ion sputtering on bonding in thermally grown silicon dioxide , 1983 .