Photo-induced refractive index change in hydrogenated amorphous silicon oxynitride

Refractive index change is shown to be induced by the irradiation of ultraviolet photons in hydrogenated amorphous silicon oxynitride films prepared by plasma-enhanced chemical vapor deposition. The mechanism of the index change and its dependence on the nitrogen content were investigated by electron spin resonance and scanning electron microscopy. It is concluded that the index change is due mainly to densification, and that the contribution of the formation of paramagnetic defects is only slight. To demonstrate the versatility of this refractive index change, a planar diffraction grating was fabricated.

[1]  E. Voges,et al.  Low-loss fiber-matched low-temperature PECVD waveguides with small-core dimensions for optical communication systems , 1997, IEEE Photonics Technology Letters.

[2]  K. Seol,et al.  Structural changes induced by KrF excimer laser photons in H2-loaded Ge-doped SiO2 glass , 1999 .

[3]  P. Lambeck,et al.  Silicon oxynitride planar waveguiding structures for application in optical communication , 1998 .

[4]  E. Voges,et al.  Refractive index profiles of ion-implanted fused silica , 1980 .

[5]  Norberto Chiodini,et al.  Vacuum ultraviolet absorption spectrum of photorefractive Sn-doped silica fiber preforms , 2001 .

[6]  Bertrand Poumellec,et al.  The UV-induced refractive index grating in Ge: preforms: additional CW experiments and the macroscopic origin of the change in index , 1996 .

[7]  L. Skuja.  Optically active oxygen-deficiency-related centers in amorphous silicon dioxide , 1998 .

[8]  A. M. Jorgensen,et al.  Ultraviolet transparent silicon oxynitride waveguides for biochemical microsystems. , 2001, Optics letters.

[9]  K. Golant,et al.  Excited oxygen-deficient center in silicon dioxide as a structurally non-rigid, mixed-valence complex , 1998 .

[10]  O. Leistiko,et al.  Plasma‐Enhanced Chemical Vapor Deposited Silicon Oxynitride Films for Optical Waveguide Bridges for Use in Mechanical Sensors , 1997 .

[11]  G. Przyrembel,et al.  Small-size silicon-oxynitride AWG demultiplexer operating around 725 nm , 2000, IEEE Photonics Technology Letters.

[12]  A. L. Tomashuk,et al.  Low-hydrogen silicon oxynitride optical fibers prepared by SPCVD , 1995 .

[13]  A. Smakula.  Über Erregung und Entfärbung lichtelektrisch leitender Alkalihalogenide , 1930 .

[14]  Robert Mertens,et al.  Influence of hydrogen on losses in silicon oxynitride planar optical waveguides , 2000 .

[15]  W Gleine,et al.  Low-pressure chemical vapor deposition silicon-oxynitride films for integrated optics. , 1992, Applied optics.

[16]  W. Kulisch,et al.  Plasma-enhanced chemical vapour deposition of silicon dioxide using tetraethoxysilane as silicon source , 1989 .

[17]  Makoto Fujimaki,et al.  Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO 2 optical-fiber gratings , 1998 .

[18]  C. Pai,et al.  Downstream microwave plasma‐enhanced chemical vapor deposition of oxide using tetraethoxysilane , 1990 .

[19]  K. Worhoff,et al.  Plasma enhanced chemical vapor deposition silicon oxynitride optimized for application in integrated optics , 1999 .

[20]  T. A. Dellin,et al.  Volume, index‐of‐refraction, and stress changes in electron‐irradiated vitreous silica , 1977 .

[21]  C.G.H. Roeloffzen,et al.  Tunable passband flattened 1-from-16 binary-tree structured add-after-drop multiplexer using SiON waveguide technology , 2000, IEEE Photonics Technology Letters.

[22]  Graeme Maxwell,et al.  Demonstration of a directly written directional coupler using UV-induced photosensitivity in a planar silica waveguide , 1995 .

[23]  D C Johnson,et al.  Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching. , 1992, Optics letters.

[24]  G. W. Arnold.  Ion implantation in silicate glasses , 1994 .

[25]  C. Pai,et al.  Ion and chemical radical effects on the step coverage of plasma enhanced chemical vapor deposition tetraethylorthosilicate films , 1990 .

[26]  Makoto Fujimaki,et al.  Ion-implantation-induced densification in silica-based glass for fabrication of optical fiber gratings , 2000 .

[27]  David J. Moss,et al.  Mechanisms of photosensitivity in germanosilica films , 1997 .

[28]  Y. Ohki,et al.  Paramagnetic centres induced in Ge-doped glass with UV irradiation , 1999 .