Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes
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Andreas Erdmann | Peter Evanschitzky | Jürgen Lorenz | Oliver H. Rudolph | Eberhard Bär | J. Lorenz | A. Erdmann | P. Evanschitzky | E. Bär | Oliver H. Rudolph
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