Normally‐Off Operation of Lateral Field‐Effect Transistors Fabricated from Ultrapure GaN/AlGaN Heterostructures
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V. Solovyev | T. Mikolajick | I. Kukushkin | R. Hentschel | A. Wachowiak | S. Wirth | S. Schmult | T. Scheinert | A. Großer | V. V. Solovyev