Error Sources In Diffraction Pattern Sampling For Optical Power Spectrum Measurements

An overview is presented of major error sources inherent in the diffraction pattern sampling technique as used for power spectrum measurment. Topics include sampling errors in the measurement of diffraction pattern intensities, the normalization of the data and the interaction of the system limiting aperture with the resulting data. Phase effects and other sources of film noise are also treated. The purpose of this discussion is to acquaint workers in this area with the potential for error and to indicate the need for careful interpretation of the data.