Advanced photomask repair technology for 65nm lithography (4)
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Osamu Suga | Ryoji Hagiwara | Anto Yasaka | Osamu Takaoka | Tomokazu Kozakai | Mamoru Okabe | Tatsuya Adachi | Osamu Matsuda | Yasutoshi Itou | Yoshiyuki Tanaka | Yasuhiko Sugiyama | Haruo Takahashi | Katsumi Suzuki | Syuichi Kikuchi | Atsushi Uemoto | Naoki Nishida
[1] Ryoji Hagiwara,et al. Advanced photomask repair technology for 65-nm lithography (1) , 2004, Photomask Japan.
[2] Ryoji Hagiwara,et al. Advanced FIB mask repair technology for ArF lithography: II , 2001, SPIE Photomask Technology.
[3] Ryoji Hagiwara,et al. Advanced FIB mask repair technology for 90-nm/ArF lithography: III , 2003, SPIE Photomask Technology.