论文信息 - Sol-gel imprint lithography for guided mode resonance structures

Sol-gel imprint lithography for guided mode resonance structures

A sol-gel based imprint lithography process has been developed to fabricate guided-mode resonance (GMR) structures. The inexpensive process offers a rapid means to create sub-micron grating waveguide structures over large surface areas. Both one-dimensional and two-dimensional GMR devices have been successfully fabricated and characterized.

Meng Lu | Longju Liu | Yin Huang | Benjamin Ch'ng

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