Characterization of Modification of 193-nm Photoresist by HBr Plasma

[Vereecke, G.; Claes, M.; Le, Q. T.; Kesters, E.; Struyf, H.] IMEC, B-3001 Heverlee, Belgium. [Carleer, R.; Adriaensens, P.] Univ Hasselt, IMO Div Chem, B-3590 Diepenbeek, Belgium. guy.vereecke@imec.be

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