Optical constants of beryllium thin layers determined from Mo/Be multilayers in spectral range 90 to 134 eV
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Franz Schäfers | Mewael Giday Sertsu | Andrey Sokolov | Nikolay Chkhalo | Vladimir Polkovnikov | Nikolay Salashchenko | Mikhail Svechnikov | F. Schäfers | A. Sokolov | M. Sertsu | V. Polkovnikov | N. Salashchenko | N. Chkhalo | M. Svechnikov
[1] K. Omote,et al. The genetic algorithm: refinement of X-ray reflectivity data from multilayers and thin films , 2000 .
[2] Mei Ding,et al. Beryllium in the Environment: A Review , 2003, Journal of environmental science and health. Part A, Toxic/hazardous substances & environmental engineering.
[3] Troy W. Barbee,et al. Advances in multilayer reflective coatings for extreme ultraviolet lithography , 1999, Advanced Lithography.
[4] Saša Bajt,et al. Molybdenum–ruthenium/beryllium multilayer coatings , 2000 .
[5] Barry J. Kent,et al. EUV band-pass filters for the ROSAT wide field camera , 1990, Optics & Photonics.
[6] F. Bijkerk,et al. Combined EUV reflectance and X-ray reflectivity data analysis of periodic multilayer structures. , 2014, Optics express.
[7] F. Schäfers,et al. Beryllium-Based Multilayer Mirrors for the Soft X-Ray and Extreme Ultraviolet Wavelength Ranges , 2020, Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques.
[8] F. Schäfers,et al. At-wavelength metrology facility for soft X-ray reflection optics. , 2016, The Review of scientific instruments.
[9] D. E. Pariev,et al. Be/Al-based multilayer mirrors with improved reflection and spectral selectivity for solar astronomy above 17 nm wavelength , 2017 .
[10] David L. Windt,et al. IMD—software for modeling the optical properties of multilayer films , 1998 .
[11] Fabio Zocchi,et al. Genetic algorithm optimization of x-ray multilayer coatings , 2004, SPIE Optics + Photonics.
[12] Eric Louis,et al. Spectral properties of La/B--based multilayer mirrors near the boron K absorption edge. , 2012, Optics express.
[13] Regina Soufli,et al. Optical constants of beryllium from photoabsorption measurements for x-ray optics applications , 1999, Optics & Photonics.
[14] P Nicolosi,et al. Analysis of buried interfaces in multilayer mirrors using grazing incidence extreme ultraviolet reflectometry near resonance edges. , 2015, Applied optics.
[15] Piergiorgio Nicolosi,et al. Deposition and characterization of B4C/CeO2 multilayers at 6.x nm extreme ultraviolet wavelengths , 2016 .
[16] Fred Bijkerk,et al. Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet , 2012 .
[17] Piergiorgio Nicolosi,et al. Characterization of TiO2 thin films in the EUV and soft X-ray region , 2015, Europe Optics + Optoelectronics.
[18] F. Schäfers,et al. Optical constants of sputtered beryllium thin films determined from photoabsorption measurements in the spectral range 20.4-250 eV. , 2020, Journal of synchrotron radiation.
[19] F. Schäfers,et al. The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II , 2016, Journal of synchrotron radiation.
[20] A. Marshall,et al. Beryllium coating for biological X‐ray microanalysis , 1984, Journal of microscopy.
[21] D. E. Pariev,et al. High-reflection Mo/Be/Si multilayers for EUV lithography. , 2017, Optics letters.
[22] Walter J. Riker. A Review of J , 2010 .