Advanced channel engineering achieving aggressive reduction of VT variation for ultra-low-power applications
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K. Fujita | M. Hori | S. Thompson | T. Ema | T. Mori | Y. Torii | J. Oh | L. Shifren | P. Ranade | M. Nakagawa | K. Okabe | T. Miyake | K. Ohkoshi | M. Kuramae | T. Tsuruta
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