Study of substrate orientations impact on Ultra Thin Buried Oxide (UTBOX) FDSOI High-K Metal gate technology performances
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O. Faynot | G. Ghibaudo | F. Balestra | T. Skotnicki | K. Bourdelle | B. Nguyen | O. Weber | C. Fenouillet-Béranger | P. Perreau | F. Andrieu | R. Beneyton | P. Gouraud | F. Boeuf | C. Richard | E. Gourvest | T. Poiroux | A. Cros | F. Abbate | C. Borowiak | D. Pellissier-Tanon | A. Margain | I. B. Akkez | S. Haendler