Microfocusing optics for hard xrays fabricated by x-ray lithography

Lithographic techniques for fabrication of hard x-ray Fresnel zone plates are discussed. Practical results achieved at the Center for X-ray Lithography of the University of Wisconsin- Madison are presented. Fabrication technology includes replication of an e-beam written master mask into a thick photoresist by synchrotron radiation x-ray lithography, and subsequent electroplating of a metal zone plate structure using photoresist pattern as a mold.