Impurity-disordered, coupled-stripe Al(x)Ga(1-x)As-GaAs quantum well laser

Continuous room‐temperature operation of impurity‐disordered, coupled‐stripe Al x Ga1−x As‐GaAs quantum wellheterostructure lasers is described. Silicon (donor) diffusion at 850 °C is used to produce layer disordering and index guiding, in addition to providing carrier confinement in a ten‐stripe coupled array (8‐μm‐wide stripes on 10‐μm centers).

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